OSA's Digital Library

Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 39, Iss. 31 — Nov. 1, 2000
  • pp: 5854–5864

Roughness and light scattering of ion-beam-sputtered fluoride coatings for 193 nm

Josep Ferré-Borrull, Angela Duparré, and Etienne Quesnel  »View Author Affiliations


Applied Optics, Vol. 39, Issue 31, pp. 5854-5864 (2000)
http://dx.doi.org/10.1364/AO.39.005854


View Full Text Article

Enhanced HTML    Acrobat PDF (4384 KB)





Browse Journals / Lookup Meetings

Browse by Journal and Year


   


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

Share
Citations

Abstract

Scattering characteristics of multilayer fluoride coatings for 193 nm deposited by ion beam sputtering and the related interfacial roughnesses are investigated. Quarter- and half-wave stacks of MgF2 and LaF3 with increasing thickness are deposited onto CaF2 and fused silica and are systematically characterized. Roughness measurements carried out by atomic force microscopy reveal the evolution of the power spectral densities of the interfaces with coating thickness. Backward-scattering measurements are presented, and the results are compared with theoretical predictions that use different models for the statistical correlation of interfacial roughnesses.

© 2000 Optical Society of America

OCIS Codes
(140.7240) Lasers and laser optics : UV, EUV, and X-ray lasers
(180.5810) Microscopy : Scanning microscopy
(290.5820) Scattering : Scattering measurements
(310.6860) Thin films : Thin films, optical properties

History
Original Manuscript: May 3, 2000
Revised Manuscript: July 31, 2000
Published: November 1, 2000

Citation
Josep Ferré-Borrull, Angela Duparré, and Etienne Quesnel, "Roughness and light scattering of ion-beam-sputtered fluoride coatings for 193 nm," Appl. Opt. 39, 5854-5864 (2000)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-39-31-5854


Sort:  Author  |  Year  |  Journal  |  Reset  

References

  1. U. Stamm, R. Paetzel, I. Bragin, J. Kleinschmidt, D. Basting, F. Voss, “Recent developments in industrial excimer laser technology,” in XI International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference, D. R. Hall, H. J. Baker, eds., Proc. SPIE3092, 485–492 (1997). [CrossRef]
  2. D. Ristau, W. Arens, S. Bosch, A. Duparré, E. Masetti, D. Jacob, G. Kiriakidis, F. Peiró, E. Quesnel, A. V. Tikhonravov, “UV-Optical and microstructural Properties of MgF2 coatings deposited by IBS and PVD processes,” in Advances in Optical Interference Coatings, C. Amra, H. Macleod, eds., Proc. SPIE3738, 436–445 (1999). [CrossRef]
  3. A. Duparré, R. Thielsch, N. Kaiser, S. Jakobs, K. Mann, E. Eva, “Surface finish and optical quality of CaF2 for UV-litography applications,” in Optical Microlithography XI, L. Van den Hove ed., Proc. SPIE3334, 1048–1054 (1998). [CrossRef]
  4. W. Arens, D. Ristau, J. Ullmann, C. Zaczek, R. Thielsch, N. Kaiser, A. Duparré, O. Apel, K. Mann, H. Lauth, H. Bernitzki, J. Ebert, S. Schippel, H. Heyer, “Properties of fluoride DUV-excimer laser optics: influence of the number of dielectric layers,” in Laser-Induced Damage in Optical Materials: 1999, G. J. Exarhos, A. H. Guenther, M. R. Kozlowski, K. L. Lewis, M. J. Soileau, eds., Proc. SPIE3902, 250–259 (2000).
  5. J. Dijon, E. Quesnel, B. Rolland, P. Garrec, C. Pellé, J. Hue, “High damage threshold fluoride UV mirrors made by ion beam sputtering,” in Laser-Induced Damage in Optical Materials Symposium, Boulder, 1997, Proc. SPIE3244, 406–416 (1998). [CrossRef]
  6. E. Quesnel, A. Petit dit Dariel, A. Duparré, J. Ferré-Borrull, J. Steinert, “DUV light scattering and morphology of ion beam sputtered fluoride coatings,” in Advances in Optical Interference Coatings, C. Amra, H. Macleod, eds., Proc. SPIE3738, 410–416 (1999). [CrossRef]
  7. E. Quesnel, M. Berger, J. Cigna, D. Duca, C. Pellé, F. Pierre, “Near-UV to IR optical characterization of YF3 thin films deposited by evaporation and ion beam processes,” in Developments in Optical Component Coatings, I. Reid, ed., Proc. SPIE2776, 366–372 (1996). [CrossRef]
  8. A. Duparré, “Light scattering of thin dielectric films,” in Thin films for Optical Coatings, R. E. Hummel, K. H. Günter, eds., Vol. 1 of Handbook of Optical Properties Series (CRC, Boca Raton, Fla., 1995), pp. 273–304.
  9. S. Jakobs, A. Duparré, H. Truckenbrodt, “Interfacial roughness and related scatter in ultraviolet optical coatings: a systematic experimental approach,” Appl. Opt. 37, 1180–1193 (1998). [CrossRef]
  10. C. Ruppe, A. Duparré, “Roughness analysis of optical films and substrates by atomic force microscopy,” Thin Solid Films 288, 8–13 (1996). [CrossRef]
  11. J. M. Bennett, L. Mattsson, Introduction to Surface Roughness and Scattering, 2nd ed. (Optical Society of America, Washington, D.C., 1999).
  12. P. Bousquet, F. Flory, P. Roche, “Scattering from multilayer thin films: theory and experiment,” J. Opt. Soc. Am. 71, 1115–1123 (1981). [CrossRef]
  13. J. M. Elson, J. P. Rahn, J. M. Bennett, “Light scattering from multilayer optics: comparison of theory and experiment,” Appl. Opt. 19, 669–679 (1980). [CrossRef] [PubMed]
  14. C. Amra, “Light scattering from multilayer optics. 1. Tools of investigation,” J. Opt. Soc. Am. A 11, 197–210 (1994). [CrossRef]
  15. C. Amra, “Light scattering from multilayer optics. 2. Application to experiment,” J. Opt. Soc. Am. A 11, 211–226 (1994). [CrossRef]
  16. A. Duparré, H.-G. Walther, “Surface smoothing and roughening by dielectric thin film deposition,” Appl. Opt. 27, 1393–1395 (1988). [CrossRef] [PubMed]
  17. E. L. Church, “Fractal surface finish,” Appl. Opt. 27, 1518–1526 (1988). [CrossRef] [PubMed]
  18. D. Jacob, F. Peiró, E. Quesnel, D. Ristau, “Microstructure and composition of MgF2 optical coatings grown on Si substrate by PVD and IBS processes,” Thin Solid Films 360, 133–138 (2000). [CrossRef]
  19. A. Duparré, S. Gliech, “Quality assessment from supersmooth to rough surfaces by multiple-wavelength light scattering measurement,” in Scattering and Surface Roughness, Z. Gu, A. A. Maradudin, eds., Proc. SPIE3141, 57–64 (1997). [CrossRef]
  20. A. Duparré, G. Notni, “Multi-type surface and thin film characterization using light scattering, scanning force microscopy and white light interferometry,” in Optical Metrology, G. A. Al-Jumaily ed., SPIE Vol. CR 72 of SPIE Critical Review Papers Series (Society of Photo-Optical Instrumentation Engineers, Bellingham, Wash., 1999), pp. 213–231.
  21. International Organization for Standardization, Working Group 6, Subcommittee 9, Technical Committee 172, “Optics and optical instruments—test methods for radiation scattered by optical components,” (International Organization for Standardization, Geneva, 1999).
  22. P. Kadkhoda, A. Müller, D. Ristau, A. Duparré, S. Gliech, H. Lauth, U. Schuhmann, N. Reng, M. Tilsch, R. Schuhmann, C. Amra, C. Deumie, C. Jolie, H. Kessler, T. Lindström, C. G. Ribbing, J. M. Bennett, “International round-robin experiment to test the International Organization for Standardization total scattering draft standard,” Appl. Opt. 39, 3321–3332 (2000). [CrossRef]
  23. S. Gliech, J. Steinert, A. Duparré, “VUV light scattering measurement of optical components for lithography applications,” in Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries, G. A. Al-Jumaily, A. Dupparé, B. Singh, eds., Proc. SPIE4099, 213–231 (2000).
  24. S. Gliech, “Total light scattering measurement from the VUV to IR spectral region,” Ph.D. dissertation (University ofIlmenau, Ilmenau, Germany) (in preparation).

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.


« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited