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Applied Optics

Applied Optics


  • Vol. 39, Iss. 31 — Nov. 1, 2000
  • pp: 5854–5864

Roughness and light scattering of ion-beam-sputtered fluoride coatings for 193 nm

Josep Ferré-Borrull, Angela Duparré, and Etienne Quesnel  »View Author Affiliations

Applied Optics, Vol. 39, Issue 31, pp. 5854-5864 (2000)

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Scattering characteristics of multilayer fluoride coatings for 193 nm deposited by ion beam sputtering and the related interfacial roughnesses are investigated. Quarter- and half-wave stacks of MgF2 and LaF3 with increasing thickness are deposited onto CaF2 and fused silica and are systematically characterized. Roughness measurements carried out by atomic force microscopy reveal the evolution of the power spectral densities of the interfaces with coating thickness. Backward-scattering measurements are presented, and the results are compared with theoretical predictions that use different models for the statistical correlation of interfacial roughnesses.

© 2000 Optical Society of America

OCIS Codes
(140.7240) Lasers and laser optics : UV, EUV, and X-ray lasers
(180.5810) Microscopy : Scanning microscopy
(290.5820) Scattering : Scattering measurements
(310.6860) Thin films : Thin films, optical properties

Original Manuscript: May 3, 2000
Revised Manuscript: July 31, 2000
Published: November 1, 2000

Josep Ferré-Borrull, Angela Duparré, and Etienne Quesnel, "Roughness and light scattering of ion-beam-sputtered fluoride coatings for 193 nm," Appl. Opt. 39, 5854-5864 (2000)

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