Scattering characteristics of multilayer fluoride coatings for 193 nm deposited by ion beam sputtering and the related interfacial roughnesses are investigated. Quarter- and half-wave stacks of MgF<sub>2</sub> and LaF<sub>3</sub> with increasing thickness are deposited onto CaF<sub>2</sub> and fused silica and are systematically characterized. Roughness measurements carried out by atomic force microscopy reveal the evolution of the power spectral densities of the interfaces with coating thickness. Backward-scattering measurements are presented, and the results are compared with theoretical predictions that use different models for the statistical correlation of interfacial roughnesses.
© 2000 Optical Society of America
(140.7240) Lasers and laser optics : UV, EUV, and X-ray lasers
(180.5810) Microscopy : Scanning microscopy
(290.5820) Scattering : Scattering measurements
(310.6860) Thin films : Thin films, optical properties
Josep Ferré-Borrull, Angela Duparré, and Etienne Quesnel, "Roughness and Light Scattering of Ion-Beam-Sputtered Fluoride Coatings for 193 nm," Appl. Opt. 39, 5854-5864 (2000)