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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 39, Iss. 34 — Dec. 1, 2000
  • pp: 6515–6516

Nonlinear Filtering in Two-Beam Interferometer

Alexander Parfenev  »View Author Affiliations


Applied Optics, Vol. 39, Issue 34, pp. 6515-6516 (2000)
http://dx.doi.org/10.1364/AO.39.006515


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Abstract

A nonlinear filtering setup visualizes wavefront aberrations. In a single-beam scheme, however, the negative and positive phase shifts cannot be distinguished. As an improvement, a two-beam nonlinear scheme is proposed. It has self-aligning properties and mechanical stability, and can be used for remote testing of large optical objects such as photolithography masks, liquid crystal substrates, jet streams and turbulence.

© 2000 Optical Society of America

Citation
Alexander Parfenev, "Nonlinear Filtering in Two-Beam Interferometer," Appl. Opt. 39, 6515-6516 (2000)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-39-34-6515


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References

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