Fabrication and Testing of Chemically Micromachined Silicon Echelle Gratings
Applied Optics, Vol. 39, Issue 7, pp. 1094-1105 (2000)
http://dx.doi.org/10.1364/AO.39.001094
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Abstract
We have fabricated large, coarsely ruled, echelle patterns on silicon wafers by using photolithography and chemical-etching techniques. The grating patterns consist of 142-μm-wide, V-shaped grooves with an opening angle of 70.6°, blazed at 54.7°. We present a detailed description of our grating-fabrication techniques and the results of extensive testing. We have measured peak diffraction efficiencies of 70% at λ = 632.8 nm and conclude that the gratings produced by our method are of sufficient quality for use in high-resolution spectrographs in the visible and near IR (λ ≃ 500–5000 nm).
© 2000 Optical Society of America
[Optical Society of America ]
OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(230.1950) Optical devices : Diffraction gratings
Citation
Luke D. Keller, Daniel T. Jaffe, Oleg A. Ershov, Thomas Benedict, and Urs U. Graf, "Fabrication and Testing of Chemically Micromachined Silicon Echelle Gratings," Appl. Opt. 39, 1094-1105 (2000)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-39-7-1094
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