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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 39, Iss. 7 — Mar. 1, 2000
  • pp: 1121–1129

Enhanced optical microlithography with a Fabry–Perot-based spatial filtering technique

Miklós Erdélyi, Zsolt Bor, William L. Wilson, Michael C. Smayling, and Frank K. Tittel  »View Author Affiliations


Applied Optics, Vol. 39, Issue 7, pp. 1121-1129 (2000)
http://dx.doi.org/10.1364/AO.39.001121


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Abstract

A coherent multiple imaging technique for use in optical microlithography was studied. The technique involves placing a thin Fabry–Perot etalon between the mask and the projection lens of an optical stepper. An optical lithographic computer simulation tool, Prolith/2, was used to evaluate the aerial image profile obtained for extended mask structures such as typical contact hole arrays and line–space patterns used in integrated circuit fabrication. Additionally, a set of experimental studies were performed to validate the simulation results. Enhancement of both resolution and depth of focus can be obtained simultaneously with appropriate etalon parameters.

© 2000 Optical Society of America

OCIS Codes
(070.6110) Fourier optics and signal processing : Spatial filtering
(100.2980) Image processing : Image enhancement
(110.4190) Imaging systems : Multiple imaging
(110.4850) Imaging systems : Optical transfer functions
(110.5220) Imaging systems : Photolithography

History
Original Manuscript: August 16, 1999
Published: March 1, 2000

Citation
Miklós Erdélyi, Zsolt Bor, William L. Wilson, Michael C. Smayling, and Frank K. Tittel, "Enhanced optical microlithography with a Fabry–Perot-based spatial filtering technique," Appl. Opt. 39, 1121-1129 (2000)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-39-7-1121


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References

  1. M. Born, E. Wolf, Principles of Optics, 6th ed. (Pergamon, New York, 1980).
  2. M. D. Levenson, “Extending the lifetime of optical lithography technologies with wavefront engineering,” Jpn. J. Appl. Phys. 33, 6765–6773 (1994). [CrossRef]
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  8. M. Erdélyi, Zs. Bor, W. L. Wilson, M. C. Smayling, F. K. Tittel, “Simulation of coherent multiple imaging by means of pupil plane filtering in optical microlithography,” J. Opt. Soc. Am. A 16, 1909–1914 (1999). [CrossRef]
  9. M. Erdélyi, A. Kroyan, K. Osvay, Zs. Bor, W. L. Wilson, M. C. Smayling, F. K. Tittel, “Coherent multiple imaging by means of pupil plane filter,” in Optical Microlithography XII, L. Van den Hove, ed., SPIE Proc.3679, 762–771 (1999).
  10. M. Erdélyi, K. Osvay, Zs. Bor, W. L. Wilson, M. C. Smayling, F. K. Tittel, “Enhanced microlithography using coherent multiple imaging, international symposium on microelectronics manufacturing technologies, in Lithography for Semiconductor Manufacturing, C. A. Mack, T. Stevenson, eds., Proc. SPIE3741, 180–188 (1999).
  11. C. Mack, Inside Prolith: A Comprehensive Guide to Optical Lithography Simulation (FINLE Technologies Inc., Austin Tex., 1997).

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