Offset of Coherent Envelope Position Due to Phase Change on Reflection
Applied Optics, Vol. 40, Issue 13, pp. 2102-2106 (2001)
http://dx.doi.org/10.1364/AO.40.002102
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Abstract
Different materials with different phase changes on reflection affect the surface-height measurement when interferometric techniques are employed for testing objects constructed of different materials that are adjacent to one another. We test the influence of this phase change on reflection when vertical scanning interferometry with a broadband source is used. We show theoretically and experimentally that the strong linear dependence of the dispersion of the phase change on reflection preserves the shape of the coherence envelope of the fringes but shifts it along the optical axis by approximately 10–40 nm for metallic surfaces.
© 2001 Optical Society of America
[Optical Society of America ]
OCIS Codes
(120.2650) Instrumentation, measurement, and metrology : Fringe analysis
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(120.3940) Instrumentation, measurement, and metrology : Metrology
(180.3170) Microscopy : Interference microscopy
Citation
Akiko Harasaki, Joanna Schmit, and James C. Wyant, "Offset of Coherent Envelope Position Due to Phase Change on Reflection," Appl. Opt. 40, 2102-2106 (2001)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-40-13-2102
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