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Applied Optics

Applied Optics


  • Vol. 40, Iss. 13 — May. 1, 2001
  • pp: 2177–2182

Low-loss dielectric mirror with ion-beam-sputtered TiO2–SiO2 mixed films

Shiuh Chao, Wen-Hsiang Wang, and Cheng-Chung Lee  »View Author Affiliations

Applied Optics, Vol. 40, Issue 13, pp. 2177-2182 (2001)

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Ion-beam-sputtered TiO2–SiO2 mixed films with 17% SiO2 concentration were used as high-refractive-index layers in a multilayered-stack dielectric mirror. Experimental results indicated that total loss of the as-deposited mirror was 34% lower than that of the as-deposited conventional mirrors with pure TiO2 films used as high-refractive-index layers. In addition, annealing reduced total loss of the mirrors. Although decreasing with an increasing annealing temperature, total loss of the conventional mirrors dramatically increased above ∼200 °C annealing temperature, owing to increased scattering from an amorphous-to-crystalline phase transition in the TiO2 films. In addition, total loss of the mirrors with the mixed films continuously decreased with an increasing annealing temperature up to 400 °C without the phase transition. Total loss was reduced 88% by means of decreasing absorption in the mixed films. Moreover, the annealed mirror with mixed films was better than both the as-deposited mirror and the conventional mirror with pure films in terms of laser-damage resistance.

© 2001 Optical Society of America

OCIS Codes
(310.0310) Thin films : Thin films
(310.1620) Thin films : Interference coatings
(310.1860) Thin films : Deposition and fabrication
(310.3840) Thin films : Materials and process characterization
(310.6860) Thin films : Thin films, optical properties
(310.6870) Thin films : Thin films, other properties

Original Manuscript: August 22, 2000
Revised Manuscript: January 2, 2001
Published: May 1, 2001

Shiuh Chao, Wen-Hsiang Wang, and Cheng-Chung Lee, "Low-loss dielectric mirror with ion-beam-sputtered TiO2–SiO2 mixed films," Appl. Opt. 40, 2177-2182 (2001)

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