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Applied Optics

Applied Optics


  • Vol. 40, Iss. 15 — May. 20, 2001
  • pp: 2479–2484

Near-field optical apertured tip and modified structures for local field enhancement

Phan Ngoc Minh, Takahito Ono, Shuji Tanaka, and Masayoshi Esashi  »View Author Affiliations

Applied Optics, Vol. 40, Issue 15, pp. 2479-2484 (2001)

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We present experimental measurements and simulation of the spatial distribution of near-field light at the aperture of a Si micromachined near-field scanning optical microscopy (NSOM) probe. A miniature aperture at the apex of a SiO2 tip on a Si cantilever was fabricated with the low temperature oxidation and selective etching technique. An optical transmission efficiency (optical throughput) of the fabricated probe was determined to be approximately 10-2 when the aperture size was approximately 100 nm, which is several orders of magnitude higher than that for conventional optical fibers. A three-dimensional finite difference time domain (FDTD) simulation shows that the near-field light is well confined within the aperture area with a throughput of 1% for a 100-nm aperture, which is in good agreement with the measurement. The spatial distribution of the near-field light at an aperture of 300-nm diameter shows a full width at half-maximum of 250 nm with a sharp peak that is nearly 60 nm wide. The 2.4% throughput for a 300-nm aperture was estimated based on the measured spatial distribution of the near-field light that is almost the same as the experimental result. We also present the initial results of the fabrication of high throughput coaxial and surface plasmon enhancement NSOM probes.

© 2001 Optical Society of America

OCIS Codes
(180.0180) Microscopy : Microscopy
(180.5810) Microscopy : Scanning microscopy
(230.4000) Optical devices : Microstructure fabrication

Original Manuscript: July 12, 2000
Revised Manuscript: February 5, 2001
Published: May 20, 2001

Phan Ngoc Minh, Takahito Ono, Shuji Tanaka, and Masayoshi Esashi, "Near-field optical apertured tip and modified structures for local field enhancement," Appl. Opt. 40, 2479-2484 (2001)

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