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Applied Optics

Applied Optics


  • Vol. 40, Iss. 16 — Jun. 1, 2001
  • pp: 2655–2661

Extreme-ultraviolet lensless Fourier-transform holography

Sang Hun Lee, Patrick Naulleau, Kenneth A. Goldberg, Chang Hyun Cho, SeongTae Jeong, and Jeffrey Bokor  »View Author Affiliations

Applied Optics, Vol. 40, Issue 16, pp. 2655-2661 (2001)

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We demonstrate 100-nm-resolution holographic aerial image monitoring based on lensless Fourier-transform holography at extreme-UV (EUV) wavelengths, using synchrotron-based illumination. This method can be used to monitor the coherent imaging performance of EUV lithographic optical systems. The system has been implemented in the EUV phase-shifting point-diffraction interferometer recently developed at Lawrence Berkeley National Laboratory. Here we introduce the idea of the holographic aerial image-recording technique and present imaging performance characterization results for a 10× Schwarzschild objective, a prototype EUV lithographic optic. The results are compared with simulations, and good agreement is obtained. Various object patterns, including phase-shift-enhanced patterns, have been studied. Finally, the application of the holographic aerial image-recording technique to EUV multilayer mask-blank defect characterization is discussed.

© 2001 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(050.1960) Diffraction and gratings : Diffraction theory
(050.5080) Diffraction and gratings : Phase shift
(070.2580) Fourier optics and signal processing : Paraxial wave optics
(070.2590) Fourier optics and signal processing : ABCD transforms
(220.3740) Optical design and fabrication : Lithography

Original Manuscript: May 9, 2000
Revised Manuscript: February 13, 2001
Published: June 1, 2001

Sang Hun Lee, Patrick Naulleau, Kenneth A. Goldberg, Chang Hyun Cho, SeongTae Jeong, and Jeffrey Bokor, "Extreme-ultraviolet lensless Fourier-transform holography," Appl. Opt. 40, 2655-2661 (2001)

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  9. These data are available at http://www-cxro.lbl.gov/optical_ constants/.
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  12. S. H. Lee, J. Bokor, P. Naulleau, S. Jeong, K. A. Goldberg, “Extreme ultraviolet holographic microscopy and its application to extreme ultraviolet mask-blank defect characterization,” J. Vac. Sci. Technol. B 18, 2935–2938 (2000). [CrossRef]

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