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Applied Optics

Applied Optics


  • Vol. 40, Iss. 16 — Jun. 1, 2001
  • pp: 2747–2754

Improved analyzer multilayers for aluminium and boron detection with x-ray fluorescence

Paulo Ricardo, Jörg Wiesmann, Claudia Nowak, Carsten Michaelsen, and Rüdiger Bormann  »View Author Affiliations

Applied Optics, Vol. 40, Issue 16, pp. 2747-2754 (2001)

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We have developed improved analyzer multilayers for the detection of aluminium (Al) and boron (B) on silicon (Si) wafers with wavelength-dispersive x-ray fluorescence spectrometers. For the detection of Al on Si wafers we show that WSi2/Si and Ta/Si multilayers provide detection limits that are 42% and 60% better, respectively, than with currently used W/Si multilayers. For the detection of B on Si wafers we show that La/B4C multilayers improve the detection limit by ∼28% compared with a conventionally used Mo/B4C multilayer.

© 2001 Optical Society of America

OCIS Codes
(120.6200) Instrumentation, measurement, and metrology : Spectrometers and spectroscopic instrumentation
(230.4170) Optical devices : Multilayers
(240.0310) Optics at surfaces : Thin films
(340.7470) X-ray optics : X-ray mirrors

Original Manuscript: August 28, 2000
Revised Manuscript: January 29, 2001
Published: June 1, 2001

Paulo Ricardo, Jörg Wiesmann, Claudia Nowak, Carsten Michaelsen, and Rüdiger Bormann, "Improved analyzer multilayers for aluminium and boron detection with x-ray fluorescence," Appl. Opt. 40, 2747-2754 (2001)

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