We have developed improved analyzer multilayers for the detection of aluminium (Al) and boron (B) on silicon (Si) wafers with wavelength-dispersive x-ray fluorescence spectrometers. For the detection of Al on Si wafers we show that WSi2/Si and Ta/Si multilayers provide detection limits that are 42% and 60% better, respectively, than with currently used W/Si multilayers. For the detection of B on Si wafers we show that La/B4C multilayers improve the detection limit by ~28% compared with a conventionally used Mo/B4C multilayer.
© 2001 Optical Society of America
(120.6200) Instrumentation, measurement, and metrology : Spectrometers and spectroscopic instrumentation
(230.4170) Optical devices : Multilayers
(240.0310) Optics at surfaces : Thin films
(340.7470) X-ray optics : X-ray mirrors
Paulo Ricardo, Jörg Wiesmann, Claudia Nowak, Carsten Michaelsen, and Rüdiger Bormann, "Improved Analyzer Multilayers for Aluminium and Boron Detection with X-Ray Fluorescence," Appl. Opt. 40, 2747-2754 (2001)