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Applied Optics

Applied Optics


  • Vol. 40, Iss. 22 — Aug. 1, 2001
  • pp: 3698–3702

Refractive sapphire microlenses fabricated by chlorine-based inductively coupled plasma etching

Si-Hyun Park, Heonsu Jeon, Youn-Joon Sung, and Geun-Young Yeom  »View Author Affiliations

Applied Optics, Vol. 40, Issue 22, pp. 3698-3702 (2001)

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We have fabricated refractive sapphire microlenses and characterized their properties for what we believe to be the first time. We use thermally reflown photoresist lenslet patterns as a mask for chlorine-based dry etch of sapphire. Pattern transfer to the mechanically hard and chemically inert sapphire substrate is made possible by an inductively coupled plasma etch system that supplies a high-density plasma gas. Processed sapphire microlenses exhibit properties close to the ideal and operate nearly in the diffraction limit.

© 2001 Optical Society of America

OCIS Codes
(220.3630) Optical design and fabrication : Lenses
(220.4000) Optical design and fabrication : Microstructure fabrication

Original Manuscript: January 11, 2001
Revised Manuscript: May 2, 2001
Published: August 1, 2001

Si-Hyun Park, Heonsu Jeon, Youn-Joon Sung, and Geun-Young Yeom, "Refractive sapphire microlenses fabricated by chlorine-based inductively coupled plasma etching," Appl. Opt. 40, 3698-3702 (2001)

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