We have fabricated refractive sapphire microlenses and characterized their properties for what we believe to be the first time. We use thermally reflown photoresist lenslet patterns as a mask for chlorine-based dry etch of sapphire. Pattern transfer to the mechanically hard and chemically inert sapphire substrate is made possible by an inductively coupled plasma etch system that supplies a high-density plasma gas. Processed sapphire microlenses exhibit properties close to the ideal and operate nearly in the diffraction limit.
© 2001 Optical Society of America
Original Manuscript: January 11, 2001
Revised Manuscript: May 2, 2001
Published: August 1, 2001
Si-Hyun Park, Heonsu Jeon, Youn-Joon Sung, and Geun-Young Yeom, "Refractive sapphire microlenses fabricated by chlorine-based inductively coupled plasma etching," Appl. Opt. 40, 3698-3702 (2001)