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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 40, Iss. 22 — Aug. 1, 2001
  • pp: 3698–3702

Refractive Sapphire Microlenses Fabricated by Chlorine-Based Inductively Coupled Plasma Etching

Si-Hyun Park, Heonsu Jeon, Youn-Joon Sung, and Geun-Young Yeom  »View Author Affiliations


Applied Optics, Vol. 40, Issue 22, pp. 3698-3702 (2001)
http://dx.doi.org/10.1364/AO.40.003698


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Abstract

We have fabricated refractive sapphire microlenses and characterized their properties for what we believe to be the first time. We use thermally reflown photoresist lenslet patterns as a mask for chlorine-based dry etch of sapphire. Pattern transfer to the mechanically hard and chemically inert sapphire substrate is made possible by an inductively coupled plasma etch system that supplies a high-density plasma gas. Processed sapphire microlenses exhibit properties close to the ideal and operate nearly in the diffraction limit.

© 2001 Optical Society of America

OCIS Codes
(220.3630) Optical design and fabrication : Lenses
(220.4000) Optical design and fabrication : Microstructure fabrication

Citation
Si-Hyun Park, Heonsu Jeon, Youn-Joon Sung, and Geun-Young Yeom, "Refractive Sapphire Microlenses Fabricated by Chlorine-Based Inductively Coupled Plasma Etching," Appl. Opt. 40, 3698-3702 (2001)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-40-22-3698


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References

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  7. See, for example, S. Nakamura and G. Fasol, The Blue Laser Diode (Springer, Berlin, 1997), Chap. 2.
  8. For a general overview see M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing (Wiley, New York, 1994), Chap. 12.
  9. H. S. Kim, D. H. Lee, Y. J. Sung, Y. H. Lee, G. Y. Yeom, J. W. Lee, S. H. Chae, and T. I. Kim, “Inductively coupled plasma etching of sapphire wafer,” in Proceedings of the 1st UK Nitride Conference (Institute of Physics, Glasgow, 1999), p. 10.
  10. Y. J. Sung, H. S. Kim, Y. H. Lee, J. W. Lee, S. H. Chae, Y. J. Park, and G. Y. Yeom, “High rate etching of sapphire wafer using Cl2/BCl3/Ar inductively coupled plasmas,” Mater. Sci. Eng. B 82, 50–52 (2001).
  11. E. D. Palik, ed., Handbook of Optical Constants of Solids II (Academic, San Diego, 1991), Chap. 2, pp. 498–500.

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