The recent interest in extreme-ultraviolet (EUV) lithography has led to the development of an array of at-wavelength metrologies implemented on synchrotron beamlines. These beamlines commonly use Kirkpatrick–Baez (K–B) systems consisting of two perpendicular, elliptically bent mirrors in series. To achieve high-efficiency focusing into a small spot, unprecedented fabrication and assembly tolerance is required of these systems. Here we present a detailed error-budget analysis and develop a set of specifications for diffraction-limited performance for the K–B optic operating on the EUV interferometry beamline at Lawrence Berkeley National Laboratory’s Advanced Light Source. The specifications are based on code v modeling tools developed explicitly for these optical systems. Although developed for one particular system, the alignment sensitivities presented here are relevant to K–B system designs in general.
© 2001 Optical Society of America
(220.1010) Optical design and fabrication : Aberrations (global)
(220.1140) Optical design and fabrication : Alignment
(220.2740) Optical design and fabrication : Geometric optical design
(220.4830) Optical design and fabrication : Systems design
(340.6720) X-ray optics : Synchrotron radiation
Patrick P. Naulleau, Kenneth A. Goldberg, Phillip J. Batson, Seongtae Jeong, and James H. Underwood, "Tolerancing of diffraction-limited Kirkpatrick-Baez synchrotron beamline optics for extreme-ultraviolet metrology," Appl. Opt. 40, 3703-3709 (2001)