Abstract
The recent interest in extreme-ultraviolet (EUV) lithography has led to the development of an array of at-wavelength metrologies implemented on synchrotron beamlines. These beamlines commonly use Kirkpatrick–Baez (K–B) systems consisting of two perpendicular, elliptically bent mirrors in series. To achieve high-efficiency focusing into a small spot, unprecedented fabrication and assembly tolerance is required of these systems. Here we present a detailed error-budget analysis and develop a set of specifications for diffraction-limited performance for the K–B optic operating on the EUV interferometry beamline at Lawrence Berkeley National Laboratory’s Advanced Light Source. The specifications are based on code v modeling tools developed explicitly for these optical systems. Although developed for one particular system, the alignment sensitivities presented here are relevant to K–B system designs in general.
© 2001 Optical Society of America
Full Article | PDF ArticleMore Like This
Hui Jiang, Jianan Xie, Yan He, Zhisen Jiang, Dongxu Liang, Huaina Yu, and Aiguo Li
Opt. Express 32(8) 13597-13613 (2024)
Sang Hun Lee, Patrick Naulleau, Kenneth A. Goldberg, Chang Hyun Cho, SeongTae Jeong, and Jeffrey Bokor
Appl. Opt. 40(16) 2655-2661 (2001)
Patrick P. Naulleau, Kenneth A. Goldberg, Sang H. Lee, Chang Chang, David Attwood, and Jeffrey Bokor
Appl. Opt. 38(35) 7252-7263 (1999)