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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 40, Iss. 25 — Sep. 1, 2001
  • pp: 4526–4533

Experimental Study of a Shearing Interferometer Concept for At-Wavelength Characterization of Extreme-Ultraviolet Optics

Petra Hegeman, Xavier Christmann, Matthieu Visser, and Joseph Braat  »View Author Affiliations


Applied Optics, Vol. 40, Issue 25, pp. 4526-4533 (2001)
http://dx.doi.org/10.1364/AO.40.004526


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Abstract

We describe the experimental evaluation of a shearing interferometer concept for at-wavelength testing of extreme-ultraviolet optics. The concept is based on the Ronchi test, which has been modified by a new design for entrance and exit gratings to suppress disturbing higher-order interference patterns. The interferometer concept has been tested on an experimental setup, of which all relevant parameters have been scaled from extreme-ultraviolet to visible-light wavelengths. A Twyman–Green interferometer has been integrated into the setup for comparison with the improved Ronchi test. A systematic difference of 7–12 mλ rms has been found between wave fronts measured with the improved Ronchi test and with the Twyman–Green interferometer. Possible error sources have been analyzed. The accuracy of the interferometer is estimated to be 10 mλ rms.

© 2001 Optical Society of America

OCIS Codes
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(260.7200) Physical optics : Ultraviolet, extreme

Citation
Petra Hegeman, Xavier Christmann, Matthieu Visser, and Joseph Braat, "Experimental Study of a Shearing Interferometer Concept for At-Wavelength Characterization of Extreme-Ultraviolet Optics," Appl. Opt. 40, 4526-4533 (2001)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-40-25-4526


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References

  1. R. H. Stulen and D. W. Sweeney, “Extreme ultraviolet lithography,” IEEE J. Quantum Electron. 35, 694–699 (1999).
  2. J. S. Taylor, G. E. Sommargren, D. W. Sweeney, and R. M. Hudyma, “The fabrication and testing of optics for EUV projection lithography,” in Emerging Lithographic Technologies II, Y. Vladimirsky, ed., Proc. SPIE 3331, 580–590 (1998).
  3. P. Naulleau, K. A. Goldberg, S. Lee, C. Chang, C. Bresloff, P. Batson, D. Attwood, and J. Bokor, “Characterization of the accuracy of EUV phase-shifting point diffraction interferometry,” in Emerging Lithographic Technologies II, Y. Vladimirsky, ed., Proc. SPIE 3331, 115–123 (1998).
  4. A. K. Ray-Chaudhuri, K. D. Krenz, R. P. Nissen, S. J. Haney, C. H. Fields, W. C. Sweatt, and A. A. MacDowell, “Initial results from an extreme ultraviolet interferometer operating with a compact laser plasma source,” J. Vac. Sci. Technol. B 14, 3964–3968 (1996).
  5. M. Visser, M. Dekker, P. Hegeman, and J. Braat, “Extended-source interferometry for at-wavelength test of EUV-optics,” in Emerging Lithographic Technologies III, Y. Vladimirsky, ed., Proc. SPIE 3676, 253–263 (1999).
  6. D. Malacara, “Twyman–Green interferometer,” in Optical Shop Testing, 2nd ed., D. Malacara, ed. (Wiley, New York, 1992), pp. 51–94.
  7. A. Cornejo-Rodriguez, “Ronchi test,” in Optical Shop Testing, 2nd ed., D. Malacara, ed. (Wiley, New York, 1992), pp. 321–365.
  8. J. Schwider, “Single sideband Ronchi test,” Appl. Opt. 20, 2635–2642 (1981).
  9. J. C. Wyant, “Double frequency grating lateral shear interferometer,” Appl. Opt. 12, 2057–2060 (1973).
  10. J. E. Bjorkholm, A. A. MacDowell, O. R. Wood II, Z. Tan, B. Lafontaine, and D. M. Tennant, “Phase-measuring interferometry using extreme ultraviolet radiation,” J. Vac. Sci. Technol. B 13, 2919–2922 (1995).
  11. J. Braat and A. J. E. M. Janssen, “An improved Ronchi test with extended source,” J. Opt. Soc. A 16, 131–140 (1999).
  12. P. Hariharan, B. F. Oreb, and T. Eiju, “Digital phase-shifting interferometry: a simple error-compensating phase calculation algorithm,” Appl. Opt. 26, 2504–2506 (1987).
  13. J. E. Greivenkamp and J. H. Bruning, “Phase shifting interferometers,” in Optical Shop Testing, 2nd ed., D. Malacara, ed. (Wiley, New York, 1992), pp. 501–598.
  14. G. Harbers, P. J. Kunst, and G. W. Leibbrandt, “Analysis of lateral shearing interferograms by use of Zernike polynomials,” Appl. Opt. 35, 6162–6172 (1996).
  15. M. Born and E. Wolf, Principles of Optics, 6th ed. (Pergamon, Oxford, 1980).
  16. G. Leibbrandt, G. Harbers, and P. J. Kunst, “Wave-front analysis with high accuracy by use of a double-grating lateral shearing interferometer,” Appl. Opt. 35, 6151–6161 (1996).

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