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Applied Optics

Applied Optics


  • Vol. 40, Iss. 25 — Sep. 1, 2001
  • pp: 4557–4561

Fabrication of mid-infrared frequency-selective surfaces by soft lithography

Kateri E. Paul, Cheng Zhu, J. Christopher Love, and George M. Whitesides  »View Author Affiliations

Applied Optics, Vol. 40, Issue 25, pp. 4557-4561 (2001)

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We describe the fabrication of large areas (4 cm2) of metallic structures or aperture elements that have ∼100–350-nm linewidths and act as frequency-selective surfaces. These structures are fabricated with a type of soft lithography—near-field contact-mode photolithography—that uses a thin elastomeric mask having topography on its surface and is in conformal contact with a layer of photoresist. The mask acts as an optical element to create minima in the intensity of light delivered to the photoresist. Depending on the type of photoresist used, lines of, or trenches in, photoresist are formed on the substrate by exposure, development, and lift-off. These surfaces act as bandpass or bandgap filters in the infrared.

© 2001 Optical Society of America

OCIS Codes
(220.3740) Optical design and fabrication : Lithography
(220.4000) Optical design and fabrication : Microstructure fabrication
(260.3060) Physical optics : Infrared
(350.2450) Other areas of optics : Filters, absorption

Original Manuscript: January 2, 2001
Revised Manuscript: June 12, 2001
Published: September 1, 2001

Kateri E. Paul, Cheng Zhu, J. Christopher Love, and George M. Whitesides, "Fabrication of mid-infrared frequency-selective surfaces by soft lithography," Appl. Opt. 40, 4557-4561 (2001)

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