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Applied Optics

Applied Optics


  • Vol. 40, Iss. 27 — Sep. 20, 2001
  • pp: 4849–4851

Xenon capillary discharge extreme-ultraviolet source emitting over a large angular range

Marc A. Klosner and William T. Silfvast  »View Author Affiliations

Applied Optics, Vol. 40, Issue 27, pp. 4849-4851 (2001)

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We describe a capillary discharge source configuration, allowing for collection of extreme-ultraviolet (EUV) radiation at large off-axis angles, without the need for an EUV window. Operating with xenon gas, the source emits intensely within the EUV spectral region at 11.3 and 13.5 nm. When coupled with a high-collection-efficiency optical system, this source may be suitable for a number of high-average-power EUV imaging applications.

© 2001 Optical Society of America

OCIS Codes
(110.3960) Imaging systems : Microlithography
(230.0230) Optical devices : Optical devices
(230.6080) Optical devices : Sources
(260.7200) Physical optics : Ultraviolet, extreme

Original Manuscript: December 21, 2000
Revised Manuscript: June 1, 2001
Published: September 20, 2001

Marc A. Klosner and William T. Silfvast, "Xenon capillary discharge extreme-ultraviolet source emitting over a large angular range," Appl. Opt. 40, 4849-4851 (2001)

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