Xenon Capillary Discharge Extreme-Ultraviolet Source Emitting Over a Large Angular Range
Applied Optics, Vol. 40, Issue 27, pp. 4849-4851 (2001)
http://dx.doi.org/10.1364/AO.40.004849
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Abstract
We describe a capillary discharge source configuration, allowing for collection of extreme-ultraviolet (EUV) radiation at large off-axis angles, without the need for an EUV window. Operating with xenon gas, the source emits intensely within the EUV spectral region at 11.3 and 13.5 nm. When coupled with a high-collection-efficiency optical system, this source may be suitable for a number of high-average-power EUV imaging applications.
© 2001 Optical Society of America
[Optical Society of America ]
OCIS Codes
(110.3960) Imaging systems : Microlithography
(230.0230) Optical devices : Optical devices
(230.6080) Optical devices : Sources
(260.7200) Physical optics : Ultraviolet, extreme
Citation
Marc A. Klosner and William T. Silfvast, "Xenon Capillary Discharge Extreme-Ultraviolet Source Emitting Over a Large Angular Range," Appl. Opt. 40, 4849-4851 (2001)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-40-27-4849
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