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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 40, Iss. 28 — Oct. 1, 2001
  • pp: 5052–5055

Precise and simple optical alignment method for double-sided lithography

Matthias Gruber, Detlev Hagedorn, and Werner Eckert  »View Author Affiliations


Applied Optics, Vol. 40, Issue 28, pp. 5052-5055 (2001)
http://dx.doi.org/10.1364/AO.40.005052


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Abstract

A method for aligning a photolithographic mask at the top of a transparent wafer that has a pattern on its bottom side is presented. The method is based on optical self-imaging of special alignment marks and provides submicrometer accuracy. The method is simple and robust and can conveniently be implemented on laboratory mask aligners for contact or proximity printing.

© 2001 Optical Society of America

OCIS Codes
(220.1140) Optical design and fabrication : Alignment
(220.3740) Optical design and fabrication : Lithography
(220.4000) Optical design and fabrication : Microstructure fabrication
(350.3950) Other areas of optics : Micro-optics

History
Original Manuscript: March 13, 2001
Revised Manuscript: May 31, 2001
Published: October 1, 2001

Citation
Matthias Gruber, Detlev Hagedorn, and Werner Eckert, "Precise and simple optical alignment method for double-sided lithography," Appl. Opt. 40, 5052-5055 (2001)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-40-28-5052

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