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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 40, Iss. 28 — Oct. 1, 2001
  • pp: 5052–5055

Precise and simple optical alignment method for double-sided lithography

Matthias Gruber, Detlev Hagedorn, and Werner Eckert  »View Author Affiliations


Applied Optics, Vol. 40, Issue 28, pp. 5052-5055 (2001)
http://dx.doi.org/10.1364/AO.40.005052


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Abstract

A method for aligning a photolithographic mask at the top of a transparent wafer that has a pattern on its bottom side is presented. The method is based on optical self-imaging of special alignment marks and provides submicrometer accuracy. The method is simple and robust and can conveniently be implemented on laboratory mask aligners for contact or proximity printing.

© 2001 Optical Society of America

OCIS Codes
(220.1140) Optical design and fabrication : Alignment
(220.3740) Optical design and fabrication : Lithography
(220.4000) Optical design and fabrication : Microstructure fabrication
(350.3950) Other areas of optics : Micro-optics

History
Original Manuscript: March 13, 2001
Revised Manuscript: May 31, 2001
Published: October 1, 2001

Citation
Matthias Gruber, Detlev Hagedorn, and Werner Eckert, "Precise and simple optical alignment method for double-sided lithography," Appl. Opt. 40, 5052-5055 (2001)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-40-28-5052


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References

  1. W. M. Moreau, Semiconductor Lithography, Principles, Practices, and Material (Plenum, New York, 1988).
  2. J. Jahns, A. Huang, “Planar integration of free-space optical components,” Appl. Opt. 28, 1602–1605 (1989). [CrossRef] [PubMed]
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  6. G. C. Boisset, B. Robertson, W. Hsiao, M. Taghizadeh, J. Simmons, K. Song, M. Matin, D. Thompson, D. Plant, “On-die diffractive structures for packaging of microlens arrays with 2D optoelectronic device arrays,” IEEE Photon. Technol. Lett. 8, 918–920 (1996). [CrossRef]
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  8. J. Sasian, D. Baillie, “Simple technique for out-of-focus feature alignment,” Opt. Eng. 34, 564–566 (1995). [CrossRef]
  9. See the URL http://www.suss.com .
  10. M. Gruber, D. Hagedorn, W. Eckert, “Ausrichtung fotolithografischer Masken relativ zu Wafern,” German patent pending (15April2000).

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