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Applied Optics

Applied Optics


  • Vol. 40, Iss. 28 — Oct. 1, 2001
  • pp: 5088–5099

Determination of optical constants of thin films and multilayer stacks by use of concurrent reflectance, transmittance, and ellipsometric measurements

Chubing Peng, Rongguang Liang, J. Kevin Erwin, Warren Bletscher, Kenichi Nagata, and Masud Mansuripur  »View Author Affiliations

Applied Optics, Vol. 40, Issue 28, pp. 5088-5099 (2001)

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Using measurements of reflectance, transmittance, and the ellipsometric parameter Δ, we have determined the thickness, refractive index, and the absorption coefficient of various thin films and thin-film stacks. (Δ, the relative phase between the p- and s-polarized components, is measured for both reflected and transmitted light.) These optical measurements are performed with a specially designed system at the fixed wavelength of λ = 633 nm over the 10°–75° range of angles of incidence. The examined samples, prepared by means of sputtering on fused-silica substrates, consist of monolayers and trilayers of various materials of differing thickness and optical constants. These samples, which are representative of the media of rewritable phase-change optical disks, include a dielectric mixture of ZnS and SiO2, an amorphous film of the Ge2Sb2.3Te5 alloy, and an aluminum chromium alloy film. To avoid complications arising from reflection and transmission losses at the air–substrate interface, the samples are immersed in an index-matching fluid that eliminates the contributions of the substrate to reflected and transmitted light. A computer program estimates the unknown parameters of the film(s) by matching the experimental data to theoretically calculated values. Although our system can be used for measurements over a broad range of wavelengths, we describe only the results obtained at λ = 633 nm.

© 2001 Optical Society of America

OCIS Codes
(120.2130) Instrumentation, measurement, and metrology : Ellipsometry and polarimetry
(310.0310) Thin films : Thin films

Original Manuscript: October 10, 2000
Revised Manuscript: May 7, 2001
Published: October 1, 2001

Chubing Peng, Rongguang Liang, J. Kevin Erwin, Warren Bletscher, Kenichi Nagata, and Masud Mansuripur, "Determination of optical constants of thin films and multilayer stacks by use of concurrent reflectance, transmittance, and ellipsometric measurements," Appl. Opt. 40, 5088-5099 (2001)

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  1. A. Rothen, “The ellipsometer, an apparatus to measure thicknesses of thin surface films,” Rev. Sci. Instrum. 16, 26–30 (1945). [CrossRef]
  2. A. B. Winterbottom, “Optical methods of studying films on reflecting bases depending on polarization and interference phenomena,” Trans. Faraday Soc. 42, 487–495 (1946). [CrossRef]
  3. R. H. Muller, “Definitions and conventions in ellipsometry,” Surf. Sci. 16, 14–33 (1969). [CrossRef]
  4. R. M. A. Azzam, N. M. Bashara, Ellipsometry and Polarized Light (North-Holland, Amsterdam, 1977).
  5. R. M. A. Azzam, “Ellipsometry,” in Handbook of Optics (McGraw-Hill, New York, 1995), Vol. 2, Chap. 27.
  6. O. S. Heavens, Optical Properties of Thin Solid Films (Butterworth, London, 1955).
  7. L. Ward, The Optical Constants of Bulk Materials and Films (Institute of Physics, London, 1994), Chap. 6, pp. 181–205.
  8. J. C. Kemp, “Piezo-optical birefringence modulators,” J. Opt. Soc. Am. 59, 950–954 (1969).
  9. S. N. Jasperson, S. E. Schnatterly, “An improved method for high reflectivity ellipsometry based on a new polarization modulation technique,” Rev. Sci. Instrum. 40, 761–767 (1969). [CrossRef]
  10. S. N. Jasperson, D. K. Burge, R. C. O’Handley, “A modulated ellipsometer for studying thin film optical properties and surface dynamics,” Surf. Sci. 37, 548–558 (1973). [CrossRef]
  11. G. J. Sprokel, “Photoelastic modulated ellipsometry on magnetooptic multilayer films,” Appl. Opt. 25, 4017–4022 (1986). [CrossRef] [PubMed]
  12. G. E. Jellison, “Two-channel spectroscopic polarization modulated ellipsometry: a new technique for the analysis of thin SiO2 films,” Thin Solid Films 206, 294–299 (1991). [CrossRef]
  13. J. Campmany, E. Bertran, A. Canillas, J. L. Andujar, J. Costa, “Error minimization method for spectroscopic and phase-modulated ellipsometric measurements on highly transparent thin films,” J. Opt. Soc. Am. A 10, 713–718 (1993). [CrossRef]
  14. T. E. Jenkins, “Multiple-angle-of-incidence ellipsometry,” J. Phys. D 32, R45–R56 (1999). [CrossRef]
  15. W. H. Press, B. P. Flannery, S. A. Teukolsky, W. T. Vetterling, Numerical Recipes in Fortran (Cambridge U. Press, London, 1989), pp. 294–301.
  16. C. Peng, L. Cheng, M. Mansuripur, “Experimental and theoretical investigation of laser-induced crystallization and amorphization in phase-change optical recording media,” J. Appl. Phys. 82, 4183–4191 (1997). [CrossRef]

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