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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 40, Iss. 31 — Nov. 1, 2001
  • pp: 5632–5637

Nanometer measurement with a dual Fabry–Perot interferometer

Benyong Chen, Ruogu Zhu, Zhaotong Wu, Dacheng Li, and Songling Guo  »View Author Affiliations


Applied Optics, Vol. 40, Issue 31, pp. 5632-5637 (2001)
http://dx.doi.org/10.1364/AO.40.005632


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Abstract

On the basis of analyzing sinusoidal phase-modulating Fabry–Perot interferometry, a method, believed to be novel, is proposed for achieving nanometer measurement accuracy by measuring the time interval between equal amplitudes of the two elementary frequency signals of the transmitted intensities of a dual Fabry–Perot interferometer. A nanometer measurement system based on the method was designed and tested. The experimental results show that the displacement resolution of the system is 0.32 nm at a 1-kHz modulating signal.

© 2001 Optical Society of America

OCIS Codes
(120.2230) Instrumentation, measurement, and metrology : Fabry-Perot
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(120.5060) Instrumentation, measurement, and metrology : Phase modulation

History
Original Manuscript: January 4, 2001
Revised Manuscript: May 9, 2001
Published: November 1, 2001

Citation
Benyong Chen, Ruogu Zhu, Zhaotong Wu, Dacheng Li, and Songling Guo, "Nanometer measurement with a dual Fabry–Perot interferometer," Appl. Opt. 40, 5632-5637 (2001)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-40-31-5632

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