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Applied Optics

Applied Optics


  • Vol. 40, Iss. 32 — Nov. 10, 2001
  • pp: 5894–5897

Diffractive optical element designed by use of an irregular etching-depth sequence

Chung J. Kuo, Hung C. Chien, Ni Y. Chang, and Chia H. Yeh  »View Author Affiliations

Applied Optics, Vol. 40, Issue 32, pp. 5894-5897 (2001)

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In fabricating a diffractive optical element the ratio of the etching depth between the (n - 1)th and the nth mask is usually 1/2. We found that the diffraction efficiency of a diffractive optical element can be improved by as much as 7.8% if the above ratio (1/2) is not kept constant. For achieving this improvement the difference between the desired and the actual diffraction pattern is also used as an objective function for phase quantization.

© 2001 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(050.1970) Diffraction and gratings : Diffractive optics
(070.2580) Fourier optics and signal processing : Paraxial wave optics

Original Manuscript: October 2, 2000
Revised Manuscript: April 17, 2001
Published: November 10, 2001

Chung J. Kuo, Hung C. Chien, Ni Y. Chang, and Chia H. Yeh, "Diffractive optical element designed by use of an irregular etching-depth sequence," Appl. Opt. 40, 5894-5897 (2001)

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