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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 40, Iss. 32 — Nov. 10, 2001
  • pp: 5894–5897

Diffractive Optical Element Designed by Use of an Irregular Etching-Depth Sequence

Chung J. Kuo, Hung C. Chien, Ni Y. Chang, and Chia H. Yeh  »View Author Affiliations


Applied Optics, Vol. 40, Issue 32, pp. 5894-5897 (2001)
http://dx.doi.org/10.1364/AO.40.005894


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Abstract

In fabricating a diffractive optical element the ratio of the etching depth between the (<i>n</i> − 1)th and the <i>n</i>th mask is usually 1/2. We found that the diffraction efficiency of a diffractive optical element can be improved by as much as 7.8% if the above ratio (1/2) is not kept constant. For achieving this improvement the difference between the desired and the actual diffraction pattern is also used as an objective function for phase quantization.

© 2001 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(050.1970) Diffraction and gratings : Diffractive optics
(070.2580) Fourier optics and signal processing : Paraxial wave optics

Citation
Chung J. Kuo, Hung C. Chien, Ni Y. Chang, and Chia H. Yeh, "Diffractive Optical Element Designed by Use of an Irregular Etching-Depth Sequence," Appl. Opt. 40, 5894-5897 (2001)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-40-32-5894

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