We present a procedure for the characterization and the linearization of the photoresist response to UV exposure for application to the gray-scale fabrication of diffractive optical elements. A simple and reliable model is presented as part of the characterization procedure. Application to the fabrication of surface-relief diffractive optical elements is presented, and theoretical predictions are shown to agree well with experiments.
© 2001 Optical Society of America
Original Manuscript: January 12, 2001
Revised Manuscript: June 27, 2001
Published: November 10, 2001
Marion LeCompte, Xiang Gao, and Dennis W. Prather, "Photoresist characterization and linearization procedure for the gray-scale fabrication of diffractive optical elements," Appl. Opt. 40, 5921-5927 (2001)