We present a procedure for the characterization and the linearization of the photoresist response to UV exposure for application to the gray-scale fabrication of diffractive optical elements. A simple and reliable model is presented as part of the characterization procedure. Application to the fabrication of surface-relief diffractive optical elements is presented, and theoretical predictions are shown to agree well with experiments.
© 2001 Optical Society of America
Marion LeCompte, Xiang Gao, and Dennis W. Prather, "Photoresist Characterization and Linearization Procedure for the Gray-Scale Fabrication of Diffractive Optical Elements," Appl. Opt. 40, 5921-5927 (2001)