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Applied Optics

Applied Optics


  • Vol. 40, Iss. 34 — Dec. 1, 2001
  • pp: 6307–6311

Analysis of the Drude model in metallic films

H. Y. Li, S. M. Zhou, J. Li, Y. L. Chen, S. Y. Wang, Z. C. Shen, L. Y. Chen, H. Liu, and X. X. Zhang  »View Author Affiliations

Applied Optics, Vol. 40, Issue 34, pp. 6307-6311 (2001)

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A method, believed to be new, to simulate Drude parameters for collective oscillation of the free carriers in metallic films is proposed. Plasma resonance frequency and relaxation were simulated simultaneously from both the real and the imaginary parts of the dielectric function of a metallic film after consideration of their correlation in the Drude model. As examples, the contributions of the electrons in Ag films and of the free carriers in metallic silicide, NbSi2 and TaSi2, films have been studied.

© 2001 Optical Society of America

OCIS Codes
(300.0300) Spectroscopy : Spectroscopy
(310.0310) Thin films : Thin films

Original Manuscript: October 10, 2000
Revised Manuscript: May 30, 2001
Published: December 1, 2001

H. Y. Li, S. M. Zhou, J. Li, Y. L. Chen, S. Y. Wang, Z. C. Shen, L. Y. Chen, H. Liu, and X. X. Zhang, "Analysis of the Drude model in metallic films," Appl. Opt. 40, 6307-6311 (2001)

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