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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 40, Iss. 5 — Feb. 10, 2001
  • pp: 644–651

Integrated photoelasticity through imaging fourier polarimetry of an elliptic retarder

Svitlana Berezhna, Ihor Berezhnyy, and Masahisa Takashi  »View Author Affiliations


Applied Optics, Vol. 40, Issue 5, pp. 644-651 (2001)
http://dx.doi.org/10.1364/AO.40.000644


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Abstract

It is shown that three optical parameters that are necessary for stress computation in integrated photoelasticity can be measured with high accuracy by use of a Fourier polarimetry method. Inasmuch as a photoelastic sample, which is an object of investigation in integrated photoelasticity, is a kind of an elliptic retarder, the technique presented here measures relative retardation δ, azimuth angle θ, and ellipticity angle ∊ instead of the characteristic parameters that traditionally have been used in integrated photoelasticity. The ability of the new technique to provide better accuracy with a simpler setup has been proved experimentally. Furthermore, the technique is self-contained as for phase measurement; i.e., it automatically performs phase unwrapping at the points where phase data exceed the value of π. The full value of a phase at a certain point is retrieved by processing of π-modulo phase data that have been precisely measured at several wavelengths. The usefulness of the new method for integrated photoelasticity has been demonstrated through measurement of a diametrically compressed disk viewed at oblique light incidence.

© 2001 Optical Society of America

OCIS Codes
(100.2000) Image processing : Digital image processing
(100.5070) Image processing : Phase retrieval
(120.4290) Instrumentation, measurement, and metrology : Nondestructive testing
(120.5410) Instrumentation, measurement, and metrology : Polarimetry
(260.1440) Physical optics : Birefringence
(350.4600) Other areas of optics : Optical engineering

History
Original Manuscript: April 3, 2000
Revised Manuscript: October 1, 2000
Published: February 10, 2001

Citation
Svitlana Berezhna, Ihor Berezhnyy, and Masahisa Takashi, "Integrated photoelasticity through imaging fourier polarimetry of an elliptic retarder," Appl. Opt. 40, 644-651 (2001)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-40-5-644


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