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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 41, Iss. 1 — Jan. 1, 2002
  • pp: 172–181

Optical design of a stigmatic extreme-ultraviolet spectroscopic system for emission and absorption studies of laser-produced plasmas

Luca Poletto, Piergiorgio Nicolosi, and Giuseppe Tondello  »View Author Affiliations


Applied Optics, Vol. 41, Issue 1, pp. 172-181 (2002)
http://dx.doi.org/10.1364/AO.41.000172


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Abstract

The design of a stigmatic spectroscopic system for diagnostics of laser-produced plasmas in the 2.5–40-nm region is presented. The system consists of a grazing-incidence toroidal mirror that focuses the radiation emitted by a laser-produced plasma onto the entrance slit of a spectrograph. The latter has a grazing-incidence spherical variable-line-spaced grating with flat-field properties coupled to a spherical focusing mirror that compensates for the astigmatism. The mirror is crossed with respect to the grating; i.e., it is mounted with its tangential plane coincident with the equatorial plane of the grating. The spectrum is acquired by an extreme-UV- (EUV-) enhanced CCD detector with high quantum efficiency. This stigmatic design also has spectral and spatial resolution capability for extended sources: The spectral resolution is also preserved for off-plane points, whereas the spatial resolution decreases for points far from the optical axis. The expected performance is presented and compared with that of a stigmatic design with a plane variable-line-spaced grating illuminated in converging light.

© 2002 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(120.6200) Instrumentation, measurement, and metrology : Spectrometers and spectroscopic instrumentation
(220.1000) Optical design and fabrication : Aberration compensation
(300.6540) Spectroscopy : Spectroscopy, ultraviolet

History
Original Manuscript: October 17, 2000
Revised Manuscript: July 6, 2001
Published: January 1, 2002

Citation
Luca Poletto, Piergiorgio Nicolosi, and Giuseppe Tondello, "Optical design of a stigmatic extreme-ultraviolet spectroscopic system for emission and absorption studies of laser-produced plasmas," Appl. Opt. 41, 172-181 (2002)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-41-1-172


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