An x-ray multilayer monochromator with improved resolution and a low specular background is presented. The monochromator consists of a lamellar multilayer amplitude grating with appropriate parameters used at the zeroth diffraction order. The device is fabricated by means of combining deposition of thin films on a nanometer scale, UV lithography, and reactive ion etching. The performance of this new monochromator at photon energies near 1500 eV is shown.
© 2002 Optical Society of America
Jean-Michel André, Rabah Benbalagh, Robert Barchewitz, Marie-Françoise Ravet, Alain Raynal, Frank Delmotte, Françoise Bridou, Gwénäelle Julié, Alain Bosseboeuf, René Laval, Gérard Soullié, Christian Rémond, and Michel Fialin, "X-ray Multilayer Monochromator with Enhanced Performance," Appl. Opt. 41, 239-244 (2002)