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Applied Optics

Applied Optics


  • Vol. 41, Iss. 1 — Jan. 1, 2002
  • pp: 239–244

X-ray multilayer monochromator with enhanced performance

Jean-Michel André, Rabah Benbalagh, Robert Barchewitz, Marie-Françoise Ravet, Alain Raynal, Frank Delmotte, Françoise Bridou, Gwénäelle Julié, Alain Bosseboeuf, René Laval, Gérard Soullié, Christian Rémond, and Michel Fialin  »View Author Affiliations

Applied Optics, Vol. 41, Issue 1, pp. 239-244 (2002)

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An x-ray multilayer monochromator with improved resolution and a low specular background is presented. The monochromator consists of a lamellar multilayer amplitude grating with appropriate parameters used at the zeroth diffraction order. The device is fabricated by means of combining deposition of thin films on a nanometer scale, UV lithography, and reactive ion etching. The performance of this new monochromator at photon energies near 1500 eV is shown.

© 2002 Optical Society of America

OCIS Codes
(300.6560) Spectroscopy : Spectroscopy, x-ray
(340.0340) X-ray optics : X-ray optics

Original Manuscript: November 16, 2000
Revised Manuscript: June 29, 2001
Published: January 1, 2002

Jean-Michel André, Rabah Benbalagh, Robert Barchewitz, Marie-Françoise Ravet, Alain Raynal, Frank Delmotte, Françoise Bridou, Gwénäelle Julié, Alain Bosseboeuf, René Laval, Gérard Soullié, Christian Rémond, and Michel Fialin, "X-ray multilayer monochromator with enhanced performance," Appl. Opt. 41, 239-244 (2002)

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