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Applied Optics

Applied Optics


  • Vol. 41, Iss. 1 — Jan. 1, 2002
  • pp: 96–100

Polarization-multiplexed diffractive optical elements fabricated by subwavelength structures

Wanji Yu, Tsuyoshi Konishi, Tetsuya Hamamoto, Hiroshi Toyota, Tsutom Yotsuya, and Yoshiki Ichioka  »View Author Affiliations

Applied Optics, Vol. 41, Issue 1, pp. 96-100 (2002)

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Polarization-multiplexed phase-only diffractive optical elements with subwavelength structures are proposed and fabricated. The differences among the phase modulations result from the differences among the effective indices exhibited in the subwavelength structures with various filling factors and surface profiles, and the phase retardations are obtained by the relief depth of the structures. The polarization-selective property is achieved by the polarization dependence of the effective indices exhibited in the one-dimensional subwavelength structures and the polarization independence exhibited in the two-dimensional structures. Additionally, the polarization contrast of our polarization-multiplexed elements, defined as the cross talk between the two polarization incidences, is independent of the relief depth. The principle of the polarization multiplexing by use of the subwavelength structures is described, and the fabrication results for the polarization-multiplexed computer-generated holograms are demonstrated.

© 2002 Optical Society of America

OCIS Codes
(220.4000) Optical design and fabrication : Microstructure fabrication
(230.5440) Optical devices : Polarization-selective devices

Original Manuscript: May 9, 2001
Revised Manuscript: August 27, 2001
Published: January 1, 2002

Wanji Yu, Tsuyoshi Konishi, Tetsuya Hamamoto, Hiroshi Toyota, Tsutom Yotsuya, and Yoshiki Ichioka, "Polarization-multiplexed diffractive optical elements fabricated by subwavelength structures," Appl. Opt. 41, 96-100 (2002)

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