We report single-wavelength ellipsometric measurements of the complex index of refraction of rough Zn<sub>3</sub>As<sub>2</sub> films on InP substrates. What we believe to be a novel technique, based on surface roughness measurements by atomic-force microscopy, is discussed to extract useful information from the ellipsometry results. The anticipated presence of a thin oxide layer is confirmed by Auger electron spectroscopy.
© 2002 Optical Society of America
(120.2130) Instrumentation, measurement, and metrology : Ellipsometry and polarimetry
(120.4530) Instrumentation, measurement, and metrology : Optical constants
(240.0310) Optics at surfaces : Thin films
Daniel J. Brink and Jacobus A. A. Engelbrecht, "Ellipsometric Investigation of Rough Zinc Arsenide Epilayers," Appl. Opt. 41, 1894-1898 (2002)