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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 41, Iss. 10 — Apr. 1, 2002
  • pp: 1894–1898

Ellipsometric investigation of rough zinc arsenide epilayers

Daniel J. Brink and Jacobus A. A. Engelbrecht  »View Author Affiliations


Applied Optics, Vol. 41, Issue 10, pp. 1894-1898 (2002)
http://dx.doi.org/10.1364/AO.41.001894


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Abstract

We report single-wavelength ellipsometric measurements of the complex index of refraction of rough Zn3As2 films on InP substrates. What we believe to be a novel technique, based on surface roughness measurements by atomic-force microscopy, is discussed to extract useful information from the ellipsometry results. The anticipated presence of a thin oxide layer is confirmed by Auger electron spectroscopy.

© 2002 Optical Society of America

OCIS Codes
(120.2130) Instrumentation, measurement, and metrology : Ellipsometry and polarimetry
(120.4530) Instrumentation, measurement, and metrology : Optical constants
(240.0310) Optics at surfaces : Thin films

History
Original Manuscript: April 3, 2001
Revised Manuscript: October 10, 2001
Published: April 1, 2002

Citation
Daniel J. Brink and Jacobus A. A. Engelbrecht, "Ellipsometric investigation of rough zinc arsenide epilayers," Appl. Opt. 41, 1894-1898 (2002)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-41-10-1894

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