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Applied Optics

Applied Optics


  • Vol. 41, Iss. 10 — Apr. 1, 2002
  • pp: 2043–2047

Internal stress and optical properties of Nb2O5 thin films deposited by ion-beam sputtering

Cheng-Chung Lee, Chuen-Lin Tien, and Jin-Cherng Hsu  »View Author Affiliations

Applied Optics, Vol. 41, Issue 10, pp. 2043-2047 (2002)

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The influence on the internal stress and optical properties of Nb2O5 thin films with ion-beam energy was investigated. Nb2O5 thin films were deposited on unheated glass substrates by means of ion-beam sputtering with different ion-beam voltage, V b . The refractive index, extinction coefficient, and surface roughness were found to depend on the ion-beam energy. The stresses in thin films were measured by the phase-shifting interferometry technique. The film stress was also found to be related to V b , and a high compressive stress of -0.467 GPa was measured at V b = 850 V. The Nb2O5–SiO2 multilayer coatings had smaller average compressive stress as compared with single-layer Nb2O5 film.

© 2002 Optical Society of America

OCIS Codes
(310.1620) Thin films : Interference coatings
(310.1860) Thin films : Deposition and fabrication
(310.3840) Thin films : Materials and process characterization

Original Manuscript: May 9, 2001
Revised Manuscript: October 2, 2001
Published: April 1, 2002

Cheng-Chung Lee, Chuen-Lin Tien, and Jin-Cherng Hsu, "Internal stress and optical properties of Nb2O5 thin films deposited by ion-beam sputtering," Appl. Opt. 41, 2043-2047 (2002)

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  1. J. R. Sites, P. Gilstrap, R. Rujkorakarn, “Ion beam sputter deposition of optical coatings,” Opt. Eng. 22, 447–449 (1983). [CrossRef]
  2. D. T. Wei, “Ion beam interference coating for ultralow optical loss,” Appl. Opt. 15, 2813–2816 (1989). [CrossRef]
  3. D. T. Wei, H. R. Kaufman, C. C. Lee, in Thin Films for Optical Systems, F. R. Flory, ed. (Marcel Dekker, New York, 1995), Chap. 6.
  4. J. Edlinger, J. Ramm, H. K. Pulker, “Properties of ion-plated Nb2O5 films,” Thin Solid Films 175, 207–212 (1989). [CrossRef]
  5. D. Konopka, D. E. Morton, F. T. Zimone, “Bipolar pulsed DC sputtering of optical films,” in Proceedings of 42nd Annual SVC Technical Conference (Society of Vacuum Centers, Chicago, 1999), pp. 217–222.
  6. H. Kupfer, T. Flugel, F. Richter, P. Schlott, “Intrinsic stress in dielectric thin films for micromechanical components,” Surf. Coat. Technol. 116-117, 116–120 (1999). [CrossRef]
  7. Q. Tang, “Study on the optical properties originated by the microstructures of thin oxide film,” Ph.D. dissertation (Kobe Design University, Kobe, Japan, 1997), pp. 139–141.
  8. C. C. Lee, J. C. Hsu, D. T. Wei, D. H. Wong, “Low loss niobium oxides film deposited by ion beam sputter deposition,” Opt. Quantum Electron. 32, 327–337 (2000). [CrossRef]
  9. J. C. Manifacier, J. Gasiot, J. P. Fillard, “A simple method for the determination of the optical constants n, k and the thickness of a weakly absorbing thin film,” J. Phys. E 9, 1002–1004 (1976). [CrossRef]
  10. C. C. Lee, C. L. Tien, W. S. Sheu, C. C. Jaing, “A new apparatus for the measurement of internal stress and thermal expansion coefficient of metal oxide films,” Rev. Sci. Instrum. 72, 2128–2213 (2001). [CrossRef]
  11. C. L. Tien, C. C. Lee, C. C. Jaing, “The measurement of thin film stress using phase shifting interferometry,” J. Mod. Opt. 47, 839–849 (2000).
  12. G. G. Stoney, “The tension of metallic films deposited by electrolysis,” Proc. R. Soc. London Ser. A 82, 172–175 (1909). [CrossRef]
  13. N. N. Davidenkov, “Measurement of residual stress in electrolytic deposits,” Sov. Phys. 2, 2595–2598 (1961).
  14. C. A. Davis, “A simple model for formation of compressive stress in thin films by ion bombardment,” Thin Solid Films 226, 30–34 (1993). [CrossRef]
  15. K. H. Muller, “Modeling ion-assisted deposition of CeO2 films,” Appl. Phys. A 40, 209–213 (1986). [CrossRef]
  16. J. Vilms, D. Kerps, “Simple stress formula for multilayered thin films on a thick substrate,” J. Appl. Phys. 53, 1536–1537 (1982). [CrossRef]
  17. A. E. Ennos, “Stress developed in optical film coatings,” Appl. Opt. 5, 51–61 (1966). [CrossRef] [PubMed]

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