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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 41, Iss. 13 — May. 1, 2002
  • pp: 2555–2560

Effect of systematic errors in spectral photometric data on the accuracy of determination of optical parameters of dielectric thin films

Alexander V. Tikhonravov, Michael K. Trubetskov, Michael A. Kokarev, Tatiana V. Amotchkina, Angela Duparré, Etienne Quesnel, Detlev Ristau, and Stefan Günster  »View Author Affiliations


Applied Optics, Vol. 41, Issue 13, pp. 2555-2560 (2002)
http://dx.doi.org/10.1364/AO.41.002555


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Abstract

The determination of optical parameters of thin films from experimental data is a typical task in the field of optical-coating technology. The optical characterization of a single layer deposited on a substrate with known optical parameters is widely used for this purpose. Results of optical characterization are dependent on not only the choice of the thin-film model but also on the quality of experimental data. The theoretical results presented highlight the effect of systematic errors in measurement data on the determination of thin-film parameters. Application of these theoretical results is illustrated by the analysis of experimental data for magnesium fluoride thin films.

© 2002 Optical Society of America

OCIS Codes
(310.0310) Thin films : Thin films
(310.3840) Thin films : Materials and process characterization

History
Original Manuscript: September 14, 2001
Revised Manuscript: January 7, 2002
Published: May 1, 2002

Citation
Alexander V. Tikhonravov, Michael K. Trubetskov, Michael A. Kokarev, Tatiana V. Amotchkina, Angela Duparré, Etienne Quesnel, Detlev Ristau, and Stefan Günster, "Effect of systematic errors in spectral photometric data on the accuracy of determination of optical parameters of dielectric thin films," Appl. Opt. 41, 2555-2560 (2002)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-41-13-2555

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