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Applied Optics

Applied Optics


  • Vol. 41, Iss. 13 — May. 1, 2002
  • pp: 2575–2585

Patterning flood illumination with microlens arrays

Ming-Hsien Wu, Kateri E. Paul, and George M. Whitesides  »View Author Affiliations

Applied Optics, Vol. 41, Issue 13, pp. 2575-2585 (2002)

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We describe a convenient lithographic technique that can produce simple, repetitive micropatterns over large areas (several square centimeters). The technique uses an illuminated array of micrometer-scale lenses to generate an array of optical patterns in an image plane located within micrometer distances from the lens array. A layer of photoresist, placed in the image plane, records the patterns. Microlenses with different sizes, profiles, composition, and indices of refraction produce corresponding patterns in exposed and developed photoresist. Both spherical and nonspherical microlenses were examined. Several types of optical element containing arrays of microlenses were fabricated and used to demonstrate that this technique can generate uniform micropatterns over large areas (>4 cm2) in a single exposure. The smallest features produced had dimensions of ∼100 nm.

© 2002 Optical Society of America

OCIS Codes
(110.3960) Imaging systems : Microlithography
(110.5220) Imaging systems : Photolithography
(160.5470) Materials : Polymers
(220.3630) Optical design and fabrication : Lenses
(350.3850) Other areas of optics : Materials processing
(350.3950) Other areas of optics : Micro-optics

Original Manuscript: July 2, 2001
Revised Manuscript: October 31, 2001
Published: May 1, 2002

Ming-Hsien Wu, Kateri E. Paul, and George M. Whitesides, "Patterning flood illumination with microlens arrays," Appl. Opt. 41, 2575-2585 (2002)

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