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Applied Optics

Applied Optics


  • Vol. 41, Iss. 16 — Jun. 1, 2002
  • pp: 3205–3210

Ion-assisted deposition of moisture-stable hafnium oxide films for ultraviolet applications

Traci R. Jensen, John Warren, and Robert L. Johnson, Jr.  »View Author Affiliations

Applied Optics, Vol. 41, Issue 16, pp. 3205-3210 (2002)

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A design-of-experiments statistical approach was taken to determine the optimum ion gun operating parameters for the deposition of moisture-stable, low-absorbing hafnium oxide films by ion-assisted electron-beam evaporation. Factors identified as affecting the quality of hafnia films were chamber pressure, deposition rate, ion gun source gas composition, and ion gun current. Both oxygen and argon were used as source gases. High and low levels of the factors were chosen on the basis of our experience with the operating range of the system, and we made a series of 24 runs with all possible combinations of these factors. From a statistical analysis of the data, we find that the best films are obtained with a 1:1 mixture of argon and oxygen, 3–3.5 × 10-4 Torr chamber pressure, 0.3-nm/s deposition rate, and 0.5-A ion gun current. X-ray diffraction measurements show that the ion-assisted films exhibit a partial monoclinic crystalline structure, whereas the unassisted films are amorphous.

© 2002 Optical Society of America

OCIS Codes
(310.0310) Thin films : Thin films
(310.1860) Thin films : Deposition and fabrication
(310.3840) Thin films : Materials and process characterization
(310.6860) Thin films : Thin films, optical properties

Original Manuscript: September 19, 2001
Revised Manuscript: February 26, 2002
Published: June 1, 2002

Traci R. Jensen, John Warren, and Robert L. Johnson, "Ion-assisted deposition of moisture-stable hafnium oxide films for ultraviolet applications," Appl. Opt. 41, 3205-3210 (2002)

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  1. F. Rainer, W. H. Lowdermilk, D. Milam, C. K. Carniglia, T. T. Hart, T. L. Lichtenstein, “Materials for optical coatings in the ultraviolet,” Appl. Opt. 24, 496–500 (1985). [CrossRef] [PubMed]
  2. P. Baumeister, O. Arnon, “Use of hafnium dioxide in multilayer dielectric reflectors for the near UV,” Appl. Opt. 16, 439–444 (1977). [CrossRef] [PubMed]
  3. T. R. Jensen, R. L. Johnson, J. Ballou, W. Prohaska, S. E. Morin, “Environmentally stable UV Raman edge filters,” Soc. Vac. Coaters Proc. Annu. Tech. Conf. 505, 239–243 (2000).
  4. J. F. Anzellotti, D. J. Smith, R. J. Sczupak, Z. R. Chrzan, “Stress and environmental shift characteristics of HfO2/SiO2 multilayer coatings,” in Laser-Induced Damage in Optical Materials: 1996, H. E. Bennett, A. H. Guenther, M. R. Kozlowski, B. E. Newnam, M. J. Soileau, eds., Proc. SPIE2966, 258–264 (1997).
  5. J. P. Lehan, Y. Mao, B. G. Bovard, H. A. Macleod, “Optical and microstructural properties of hafnium dioxide thin films,” Thin Solid Films 203, 227–250 (1991). [CrossRef]
  6. M. Gilo, N. Croitoru, “Study of HfO2 films prepared by ion-assisted deposition using a gridless end-hall ion source,” Thin Solid Films 350, 203–208 (1999). [CrossRef]
  7. R. Götzelmann, H. Hagedorn, A. Zöller, “UV coatings produced with plasma-ion-assisted deposition,” in Advances in Optical Interference Coatings, C. Amra, H. A. Macleod, eds., Proc. SPIE3738, 48–57 (1999).
  8. M. Alvisi, S. Scaglione, S. Martelli, A. Rizzo, L. Vasanelli, “Structural and optical modification in hafnium oxide thin films related to the momentum parameter transferred by ion beam assistance,” Thin Solid Films 354, 19–23 (1999). [CrossRef]
  9. J. J. McNally, G. A. Al-Jumaily, S. R. Wilson, J. R. McNeil, “Ion beam assisted deposition of optical thin films—recent results,” in Southwest Conference on Optics, ’85, S. C. Stotlar, ed., Proc. SPIE540, 479–485 (1985).
  10. O. Zabeida, J. E. Klemberg-Sapieha, L. Martinu, D. Morton, “Ion bombardment characteristics during the growth of optical films using a cold cathode ion source,” Soc. Vac. Coaters Proc. Annu. Tech. Conf. 504, 267–271 (1999).
  11. D. Morton, Denton Vacuum, Moorestown, N.J. (personal communication, 2000).

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