OSA's Digital Library

Applied Optics

Applied Optics


  • Vol. 41, Iss. 16 — Jun. 1, 2002
  • pp: 3211–3217

Mechanical Stress and Thermal-Elastic Properties of Oxide Coatings for Use in the Deep-Ultraviolet Spectral Region

Roland Thielsch, Alexandre Gatto, and Norbert Kaiser  »View Author Affiliations

Applied Optics, Vol. 41, Issue 16, pp. 3211-3217 (2002)

View Full Text Article

Acrobat PDF (846 KB)

Browse Journals / Lookup Meetings

Browse by Journal and Year


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools



Mechanical stress and the structures of SiO2, Al2O3, and HfO2 single oxide layers and of high-reflection multilayer coatings deposited by reactive evaporation, plasma ion-assisted deposition, and ion-beam sputtering have been studied. The stress was related to the microstructure and to the incorporation of water by means of infrared spectroscopy. From the slopes of measured stress-temperature curves of these coatings deposited onto two substrate materials (silicon and fused silica), the biaxial moduli and the thermal expansion coefficients of the films were estimated.

© 2002 Optical Society of America

OCIS Codes
(310.0310) Thin films : Thin films
(310.3840) Thin films : Materials and process characterization
(310.6860) Thin films : Thin films, optical properties

Roland Thielsch, Alexandre Gatto, and Norbert Kaiser, "Mechanical Stress and Thermal-Elastic Properties of Oxide Coatings for Use in the Deep-Ultraviolet Spectral Region," Appl. Opt. 41, 3211-3217 (2002)

Sort:  Author  |  Year  |  Journal  |  Reset


  1. F. Rainer, H. W. Lowdermilk, D. Milam, C. K. Carniglia, T. Tuttle “Materials for optical coatings in the ultraviolet,” Appl. Opt. 24, 496–500 (1985).
  2. P. Baumeister and O. Arnon, “Use of hafnium dioxide in multi-layer dielectric reflectors for the near UV,” Appl. Opt. 16, 439–444 (1977).
  3. F. Rainer, D. Milam, and W. H. Lowdermilk, “Laser damage threshold of thin optical coatings at 248 nm,” NBS Spec. Publ. 638, 339–443 (1981).
  4. G. G. Stoney, “The tension of metallic films deposited by electrolysis,” Proc. R. Soc. London Ser. A 32, 172–175 (1909).
  5. KLA-Tencor, “Thin film stress measurement system TENCOR FLX 2320,” manual (KLA-Tencor, San Jose, Calif., 1995).
  6. A. E. Ennos, “Stresses developed in optical film coatings,” Appl. Opt. 5, 51–61 (1966).
  7. E. H. Hirsch, “Stress in porous thin films through adsorption of polar molecules,” J. Phys. D 13, 2081–2094 (1980).
  8. H. K. Pulker, “Mechanical properties of optical films,” Thin Solid Films 89, 191–204 (1982).
  9. S. Tamulevicius, “Stress and strain in vacuum deposited thin films,” Vacuum 51, 127–139 (1998).
  10. N. Kaiser, H. Uhlig, U. B. Schallenberg, B. Anton, U. Kaiser, K. Mann, and E. Eva, “High damage threshold Al2O3/SiO2 dielectric coatings for excimer lasers,” Thin Solid Films 260, 86–92 (1995).
  11. J. Kolbe and H. Schink, “Optical losses of dielectric VUV mirrors deposited by conventional evaporation, IAD, and IBS,” in Thin Films for Optical Systems, K. H. Guenther, ed., Proc. SPIE 1782, 435–447 (1992).
  12. A. Zoller, S. Beisswenger, R. Gotzelmann and K. Matl “Plasma ion assisted deposition: a novel technique for the production of optical coatings,” in Optical Interference Coatings, F. Abeles, ed., Proc. SPIE 2253, 394–402 (1994).
  13. M. Alvisi, S. Scaglione, S. Martelli, A. Rizzo, and L. Vasanelli, “Structural and optical modification in hafnium oxide thin films related to the momentum parameter transferred by ion beam assistance,” Thin Solid Films 354, 19–23 (1999).
  14. W. Kreher and W. Pompe, Internal Stresses in Heterogeneous Solids (Akademie-Verlag, Berlin 1989).
  15. S. L. Dole, O. Hunter, and C. J. Wooge, “Elastic properties of monoclinic hafnium oxide at room temperature,” J. Am. Ceram. Soc. 60, 488–490 (1977).
  16. D. P. H. Hasselman, “On the porosity dependence of the elastic moduli of polycrystalline refractory materials,” J. Am. Ceram. Soc. 45, 452–453 (1962).
  17. R. M. Spriggs, “Effect of open and closed pores on elastic moduli of polycrystalline alumina,” J. Am. Ceram. Soc. 45, 454 (1962).
  18. J. B. Wachtman and D. G. Lam, “Young’s modulus of various refractory materials as a function of temperature,” J. Am. Ceram. Soc. 47, 254–260 (1959).
  19. R. Thielsch, T. Feigl, N. Kaiser, S. Martin, S. Scaglione, F. Sarto, M. Alvisi, and A. Rizzo, “Comparison of the optical properties and UV radiation resistance of HfO2 single layers deposited by reactive evaporation, IAD, and PIAD,” in Laser-Induced Damage in Optical Materials: 1999, G. J. Exarhos, A. H. Guenther, M. R. Kozlowski, K. L. Lewis, and M. J. Soileau, eds., Proc. SPIE 3902, 182–193 (2000).
  20. H. Günther, “Structure and related properties of thin-film optical coatings,” in Optical Thin Films II: New Developments, R. I. Seddon, ed., Proc. SPIE 678, 2–11 (1986).
  21. H. A. McLeod, “Structure-related optical properties of thin films,” J. Vac. Sci. Technol. A 4, 418–422 (1986).

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.

« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited