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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 41, Iss. 16 — Jun. 1, 2002
  • pp: 3224–3235

Light-scattering measurements of optical thin-film components at 157 and 193 nm

Stefan Gliech, Jörg Steinert, and Angela Duparré  »View Author Affiliations


Applied Optics, Vol. 41, Issue 16, pp. 3224-3235 (2002)
http://dx.doi.org/10.1364/AO.41.003224


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Abstract

An instrument for total backscattering and forward-scattering measurements of optical coating components at 157 and 193 nm is described. The system is operated in both vacuum and nitrogen purge gas. An excimer laser as well as a deuterium lamp can be used as a radiation source. Suppression of the background signal level to 1 part in 106 permits measurements even of low-scatter samples such as superpolished substrates and antireflection coatings. Results of investigations of antireflective and highly reflective multilayers and CaF2 substrates reveal scattering from surface and interface roughness as well as from the volume of the substrate material. First steps to extend the instrument for angle-resolved scatter, transmittance, and reflectance measurements are described.

© 2002 Optical Society of America

OCIS Codes
(120.5820) Instrumentation, measurement, and metrology : Scattering measurements
(240.5770) Optics at surfaces : Roughness
(260.7190) Physical optics : Ultraviolet
(310.0310) Thin films : Thin films
(310.1620) Thin films : Interference coatings

History
Original Manuscript: October 1, 2001
Revised Manuscript: January 4, 2002
Published: June 1, 2002

Citation
Stefan Gliech, Jörg Steinert, and Angela Duparré, "Light-scattering measurements of optical thin-film components at 157 and 193 nm," Appl. Opt. 41, 3224-3235 (2002)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-41-16-3224

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