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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 41, Iss. 16 — Jun. 1, 2002
  • pp: 3224–3235

Light-scattering measurements of optical thin-film components at 157 and 193 nm

Stefan Gliech, Jörg Steinert, and Angela Duparré  »View Author Affiliations


Applied Optics, Vol. 41, Issue 16, pp. 3224-3235 (2002)
http://dx.doi.org/10.1364/AO.41.003224


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Abstract

An instrument for total backscattering and forward-scattering measurements of optical coating components at 157 and 193 nm is described. The system is operated in both vacuum and nitrogen purge gas. An excimer laser as well as a deuterium lamp can be used as a radiation source. Suppression of the background signal level to 1 part in 106 permits measurements even of low-scatter samples such as superpolished substrates and antireflection coatings. Results of investigations of antireflective and highly reflective multilayers and CaF2 substrates reveal scattering from surface and interface roughness as well as from the volume of the substrate material. First steps to extend the instrument for angle-resolved scatter, transmittance, and reflectance measurements are described.

© 2002 Optical Society of America

OCIS Codes
(120.5820) Instrumentation, measurement, and metrology : Scattering measurements
(240.5770) Optics at surfaces : Roughness
(260.7190) Physical optics : Ultraviolet
(310.0310) Thin films : Thin films
(310.1620) Thin films : Interference coatings

History
Original Manuscript: October 1, 2001
Revised Manuscript: January 4, 2002
Published: June 1, 2002

Citation
Stefan Gliech, Jörg Steinert, and Angela Duparré, "Light-scattering measurements of optical thin-film components at 157 and 193 nm," Appl. Opt. 41, 3224-3235 (2002)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-41-16-3224


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References

  1. International Organization for Standardization Working Group 6, “Optics and optical instruments—Laser and laser related equipment—Test method for radiation scattered by optical components,” ISO/DIS standard 13696 (International Organization for Standardization, Geneva, 1999).
  2. J. C. Stover, Optical Scattering: Measurement and Analysis, 2nd ed. (SPIE Press, Bellingham, Wash., 1995).
  3. J. M. Bennett, L. Mattsson, Introduction to Surface Roughness and Scattering, 2nd ed. (Optical Society of America, Washington, D.C., 1999).
  4. American Society for Testing and Materials, “Standard test method for measuring the effective surface roughness of optical components by total integrated scattering,” document F1048–87 (American Society for Testing and Materials, Philadelphia, 1987).
  5. P. Kadkhoda, A. Müller, D. Ristau, A. Duparré, S. Gliech, H. Lauth, U. Schuhmann, N. Reng, M. Tilsch, R. Schuhmann, C. Amra, C. Deumie, C. Jolie, H. Kessler, T. Lindström, C. G. Ribbing, J. M. Bennett, “International round-robin experiment to test the International Organization for Standardization total scattering draft standard,” Appl. Opt. 39, 3321–3332 (2000). [CrossRef]
  6. O. Apel, K. Mann, “DUV scattering measurements as a tool for characterization of UV-optical surfaces,” Appl. Phys. A 72, 59–65 (2001). [CrossRef]
  7. P. Kadkhoda, H. Welling, St. Günster, D. Ristau, “Investigations on total scattering at 157 nm and 193 nm,” in Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries, G. A. Al-Jumaily, A. Duparré, B. Singh, eds., Proc SPIE4099, 65–73 (2000).
  8. P. Kadkhoda, St. Günster, D. Ristau, “Calibration aspects of total scatter measurements in the DUV/VUV,” presented at the Sixth International Workshop on Laser Beam and Optics Characterization, subconference of Lasers in Manufacturing meeting, Munich, Germany, 18–20 June 2001.
  9. T. Saito, J. Saito, E. Nakamura, T. Kudo, M. Kagaya, T. Takahashi, “Measurement of total integrated scatter of optical coatings for 157-nm lithography,” in Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries II, A. Duparre, B. Singh, eds., Proc. SPIE4449, 22–29 (2001).
  10. V. Liberman, T. M. Bloomstein, M. Rothschild, “Determination of optical properties of thin films and surfaces in 157-nm lithography,” in Metrology, Inspection, and Process Control for Microlithography XIV, N. T. Sullivan, ed., Proc. SPIE3998, 480–491 (2000).
  11. A. Duparré, G. Notni, “Multi-type surface and thin film characterization using light scattering, scanning force microscopy and white light interferometry,” in Optical Metrology, G. A. Al-Jumaily, ed., Vol. CR 72 of SPIE Critical Review Paper Series (SPIE, Bellingham, Wash., 1999), pp. 213–231.
  12. A. Duparré, S. Gliech, “Quality assessment from supersmooth to rough surfaces by multiple wavelength light scattering measurements,” in Scattering and Surface Roughness, Z. Gu, A. A. Maradudin, eds., Proc. SPIE3141, 57–64 (1997).
  13. M. Flemming, “Experimentelle Untersuchungen zur Strahlformung und Signaldetektion im tiefen ultravioletten Spektralbereich,” diploma dissertation (Westsächsische Hochschule Zwickau, Zwickau, Germany, 2000).
  14. D. Rönnow, E. Veszelei, “Design review of an instrument for spectroscopic total integrated light scattering measurements in the visible wavelength region,” Rev. Sci. Instrum. 65, 327–334 (1994). [CrossRef]
  15. S. Gliech, A. Duparré, G. Notni, “Vorrichtung zur Bestimmung des an einer Probe gestreuten Lichtes,” German patent299 04 098.4 (8March, 1999).
  16. J. Steinert, A. Duparré, S. Gliech, G. Notni, “Verfahren zur Unterdrückung der Lichtstreuung an Spülgasen bei gleichzeitiger Unterdrückung von Kontaminationen und Ablagerungen beim Einsatz von Wellenlängen kleiner 200 nm,” German patent101 47 089.4 (25September2001).
  17. J. Ferré-Borrull, A. Duparré, E. Quesnel, “Roughness and light scattering of ion-beam-sputtered fluoride coatings for 193 nm,” Appl. Opt. 39, 5854–5864 (2000). [CrossRef]
  18. J. Ferré-Borrull, A. Duparré, E. Quesnel, “Procedure to characterize microroughness of optical thin films: application to ion-beam-sputtered vacuum-ultraviolet coatings,” Appl. Opt. 40, 2190–2199 (2001). [CrossRef]
  19. S. Jakobs, A. Duparré, H. Truckenbrodt, “Interfacial roughness and related scatter in ultraviolet optical coatings: a systematic experimental approach,” Appl. Opt. 37, 1180–1193 (1998). [CrossRef]
  20. C. K. Carniglia, “Scalar scattering theory for multilayer optical coatings,” Opt. Eng. 18, 104–115 (1979). [CrossRef]
  21. A. Duparré, “Light scattering of thin dielectric films,” in Thin Films for Optical Coatings, R. E. Hummel, K. H. Guenther, eds., Vol. 1 of Handbook of Optical Properties Series (CRC, Boca Raton, Fla., 1995), pp. 273–304.
  22. H. Bernitzki, A. Duparré, S. Gliech, M. Klaus, H. Lauth, R. Stollmann, “Reflectance and scatter losses of 157 nm HR-coatings,” presented at the SEMATECH 157 nm data review meeting, San Diego, Calif., 14–16 November 2000.

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