High-Reflectivity HfO2/SiO2 Ultraviolet Mirrors
Applied Optics, Vol. 41, Issue 16, pp. 3256-3261 (2002)
http://dx.doi.org/10.1364/AO.41.003256
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Abstract
High-reflectivity dense multilayer coatings were produced for the ultraviolet spectral region. Thin-film single layers and UV mirrors were deposited by ion plating and plasma ion-assisted deposition high- energetic technologies. Optical characterizations of HfO2 and SiO2 single layers are made. The optical constants obtained for these two materials are presented. HfO2 and SiO2 mirrors with a reflectance of ~99% near 250 nm are reported.
© 2002 Optical Society of America
[Optical Society of America ]
OCIS Codes
(310.0310) Thin films : Thin films
(310.1620) Thin films : Interference coatings
(310.1860) Thin films : Deposition and fabrication
(310.3840) Thin films : Materials and process characterization
(310.6860) Thin films : Thin films, optical properties
(310.6870) Thin films : Thin films, other properties
Citation
Philippe Torchio, Alexandre Gatto, Marco Alvisi, Gérard Albrand, Norbert Kaiser, and Claude Amra, "High-Reflectivity HfO2/SiO2 Ultraviolet Mirrors," Appl. Opt. 41, 3256-3261 (2002)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-41-16-3256
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