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Applied Optics

Applied Optics


  • Vol. 41, Iss. 16 — Jun. 1, 2002
  • pp: 3256–3261

High-reflectivity HfO2/SiO2 ultraviolet mirrors

Philippe Torchio, Alexandre Gatto, Marco Alvisi, Gérard Albrand, Norbert Kaiser, and Claude Amra  »View Author Affiliations

Applied Optics, Vol. 41, Issue 16, pp. 3256-3261 (2002)

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High-reflectivity dense multilayer coatings were produced for the ultraviolet spectral region. Thin-film single layers and UV mirrors were deposited by ion plating and plasma ion-assisted deposition high- energetic technologies. Optical characterizations of HfO2 and SiO2 single layers are made. The optical constants obtained for these two materials are presented. HfO2 and SiO2 mirrors with a reflectance of ∼99% near 250 nm are reported.

© 2002 Optical Society of America

OCIS Codes
(310.0310) Thin films : Thin films
(310.1620) Thin films : Interference coatings
(310.1860) Thin films : Deposition and fabrication
(310.3840) Thin films : Materials and process characterization
(310.6860) Thin films : Thin films, optical properties
(310.6870) Thin films : Thin films, other properties

Original Manuscript: July 24, 2001
Revised Manuscript: January 2, 2002
Published: June 1, 2002

Philippe Torchio, Alexandre Gatto, Marco Alvisi, Gérard Albrand, Norbert Kaiser, and Claude Amra, "High-reflectivity HfO2/SiO2 ultraviolet mirrors," Appl. Opt. 41, 3256-3261 (2002)

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