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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 41, Iss. 16 — Jun. 1, 2002
  • pp: 3262–3269

Atomic-Precision Multilayer Coating of the First Set of Optics for an Extreme-Ultraviolet Lithography Prototype System

Claude Montcalm, R. Frederick Grabner, Russell M. Hudyma, Mark A. Schmidt, Eberhard Spiller, Christopher C. Walton, Marco Wedowski, and James A. Folta  »View Author Affiliations


Applied Optics, Vol. 41, Issue 16, pp. 3262-3269 (2002)
http://dx.doi.org/10.1364/AO.41.003262


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Abstract

We present our results of coating a first set of optical elements for an extreme-ultraviolet (EUV) lithography system. The optics were coated with Mo-Si multilayer mirrors by dc magnetron sputtering and characterized by synchrotron radiation. Near-normal incidence reflectances above 65% were achieved at 13.35 nm. The run-to-run reproducibility of the reflectance peak wavelength was maintained to within 0.4%, and the thickness uniformity (or gradient) was controlled to within ±0.05% peak to valley, exceeding the prescribed specification. The deposition technique used for this study is an enabling technology for EUV lithography, making it possible to fabricate multilayer-coated optics to accuracies commensurate with atomic dimensions.

© 2002 Optical Society of America

OCIS Codes
(110.3960) Imaging systems : Microlithography
(220.3740) Optical design and fabrication : Lithography
(260.7200) Physical optics : Ultraviolet, extreme
(310.1860) Thin films : Deposition and fabrication
(340.7470) X-ray optics : X-ray mirrors

Citation
Claude Montcalm, R. Frederick Grabner, Russell M. Hudyma, Mark A. Schmidt, Eberhard Spiller, Christopher C. Walton, Marco Wedowski, and James A. Folta, "Atomic-Precision Multilayer Coating of the First Set of Optics for an Extreme-Ultraviolet Lithography Prototype System," Appl. Opt. 41, 3262-3269 (2002)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-41-16-3262

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