Atomic-Precision Multilayer Coating of the First Set of Optics for an Extreme-Ultraviolet Lithography Prototype System
Applied Optics, Vol. 41, Issue 16, pp. 3262-3269 (2002)
http://dx.doi.org/10.1364/AO.41.003262
Acrobat PDF (160 KB)
Abstract
We present our results of coating a first set of optical elements for an extreme-ultraviolet (EUV) lithography system. The optics were coated with Mo-Si multilayer mirrors by dc magnetron sputtering and characterized by synchrotron radiation. Near-normal incidence reflectances above 65% were achieved at 13.35 nm. The run-to-run reproducibility of the reflectance peak wavelength was maintained to within 0.4%, and the thickness uniformity (or gradient) was controlled to within ±0.05% peak to valley, exceeding the prescribed specification. The deposition technique used for this study is an enabling technology for EUV lithography, making it possible to fabricate multilayer-coated optics to accuracies commensurate with atomic dimensions.
© 2002 Optical Society of America
[Optical Society of America ]
OCIS Codes
(110.3960) Imaging systems : Microlithography
(220.3740) Optical design and fabrication : Lithography
(260.7200) Physical optics : Ultraviolet, extreme
(310.1860) Thin films : Deposition and fabrication
(340.7470) X-ray optics : X-ray mirrors
Citation
Claude Montcalm, R. Frederick Grabner, Russell M. Hudyma, Mark A. Schmidt, Eberhard Spiller, Christopher C. Walton, Marco Wedowski, and James A. Folta, "Atomic-Precision Multilayer Coating of the First Set of Optics for an Extreme-Ultraviolet Lithography Prototype System," Appl. Opt. 41, 3262-3269 (2002)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-41-16-3262
You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
You do not have subscription access to this journal. Article level metrics are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
Related Journal Articles 
- Detailed space-resolved characterization of a laser-plasma soft-x-ray source at 13.5-nm wavelength with tin and its oxides (JOSAB)
- New layer-by-layer multilayer design method (JOSAA)
- Reflectance enhancement in the extreme ultraviolet and soft x rays by means of multilayers with more than two materials (JOSAA)
- Layer-by-layer design method for multilayers with barrier layers: application to Si/Mo multilayers for extreme-ultraviolet lithography (JOSAA)
- Inreflectance: a new function for the optimization of multilayers with absorbing materials (JOSAA)
Related Conference Papers
- Diode-Pumped Garnet Crystal Waveguide Structures Fabricated by Pulsed Laser Deposition
- Ultra-Fast Lasers for Nano-Material Growth and Processing
- Study of Two-Photon Laser Photolithography with SU-8 at Cryogenic Temperatures
- Aspheres in microlithography
- One step non-contact fabrication of polymer microlens arrays by thermocapillary lithography
« Previous Article | Next Article »
OSA is a member of 