A black layer coating for an aluminum–photoresist interface with a reflectance less than 0.1% for 413-nm, <i>s</i>-polarized light incident at 25° is described. It is made of space-compatible materials, and its rms roughness is less than 15 Å.
© 2002 Optical Society of America
(050.1950) Diffraction and gratings : Diffraction gratings
(310.1620) Thin films : Interference coatings
(310.1860) Thin films : Deposition and fabrication
(310.6860) Thin films : Thin films, optical properties
Daniel Poitras, J. A. Dobrowolski, Tom Cassidy, Clive Midwinter, and C. Thomas McElroy, "Black Layer Coatings for the Photolithographic Manufacture of Diffraction Gratings," Appl. Opt. 41, 3306-3311 (2002)