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Applied Optics

Applied Optics


  • Vol. 41, Iss. 19 — Jul. 1, 2002
  • pp: 3911–3918

Müller matrix measurements of small spherical particles deposited on a c -Si wafer

Bernard Kaplan and Bernard Drévillon  »View Author Affiliations

Applied Optics, Vol. 41, Issue 19, pp. 3911-3918 (2002)

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Müller matrix ellipsometry measurements are performed on accurately sized polystyrene latex and silicon oxide spherical particles deposited on a crystalline silicon surface. The mean particle diameter ranges from 0.2 to 1.5 µm. An argon laser beam (wavelength, 515 nm) impinges on the sample at a fixed near-grazing-incidence angle. The Müller matrix of the diffuse light scattered by the particles is measured in the plane of incidence as a function of the scattering angle. Results are presented and compared with Bobbert and Vlieger’s theory. In particular the validity range of Videen’s model is estimated.

© 2002 Optical Society of America

OCIS Codes
(120.5410) Instrumentation, measurement, and metrology : Polarimetry
(120.5820) Instrumentation, measurement, and metrology : Scattering measurements
(290.5850) Scattering : Scattering, particles

Original Manuscript: April 3, 2001
Revised Manuscript: October 1, 2001
Published: July 1, 2002

Bernard Kaplan and Bernard Drévillon, "Müller matrix measurements of small spherical particles deposited on a c-Si wafer," Appl. Opt. 41, 3911-3918 (2002)

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