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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 41, Iss. 19 — Jul. 1, 2002
  • pp: 3961–3965

Fabry-Perot-type antireflective coating for deep-ultraviolet binary photomask applications

Hsuen-Li Chen, Tieh-Chi Chu, Chien-Kui Hsu, Fu-Hsiang Ko, and Tiao-Yuan Huang  »View Author Affiliations


Applied Optics, Vol. 41, Issue 19, pp. 3961-3965 (2002)
http://dx.doi.org/10.1364/AO.41.003961


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Abstract

We demonstrate an antireflective coating structure, which is based on the three-layer metal interference called the Fabry–Perot structure, for a deep-ultraviolet binary mask. The antireflective coating structure is composed of a metal–oxide–metal stack. By addition of different optimized structures, reflectances of less than 1.5% at both 248 and 193 nm have been achieved. At the three-layer Fabry–Perot structure, the bottom chrome layer provides suitable absorption. By controlling the thickness of the intermediate silicon oxide layer, we can tune the minimum-reflection regime to the desired exposure wavelength. The top metal layer can prevent charge accumulation during e-beam writing.

© 2002 Optical Society of America

OCIS Codes
(220.3740) Optical design and fabrication : Lithography
(310.1210) Thin films : Antireflection coatings
(310.1620) Thin films : Interference coatings
(310.1860) Thin films : Deposition and fabrication

History
Original Manuscript: June 25, 2001
Revised Manuscript: January 3, 2002
Published: July 1, 2002

Citation
Hsuen-Li Chen, Tieh-Chi Chu, Chien-Kui Hsu, Fu-Hsiang Ko, and Tiao-Yuan Huang, "Fabry-Perot-type antireflective coating for deep-ultraviolet binary photomask applications," Appl. Opt. 41, 3961-3965 (2002)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-41-19-3961

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