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Applied Optics

Applied Optics


  • Vol. 41, Iss. 2 — Jan. 10, 2002
  • pp: 281–289

Fan-out diffractive optical elements designed for increased fabrication tolerances to linear relief depth errors

Jörgen Bengtsson and Mathias Johansson  »View Author Affiliations

Applied Optics, Vol. 41, Issue 2, pp. 281-289 (2002)

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The intensity uniformity of the spots generated by fan-out diffractive optical elements (DOEs) (or kinoforms) is often highly sensitive to any fabrication error that leads to a deviation of the surface-relief depth of the DOE from its design value. Many of the fabrication errors, such as those that are due to insufficient control of development or etch rates, increase almost linearly with the desired relief depth in every position of the DOE. We present an algorithm for designing fan-out DOEs with a significantly reduced sensitivity of the intensity uniformity to such errors. The reduced sensitivity can be obtained without reducing the efficiency of the DOE. Experimental results for fabricated DOEs show that reduced sensitivity is also obtained in practice.

© 2002 Optical Society of America

OCIS Codes
(050.1970) Diffraction and gratings : Diffractive optics
(220.0220) Optical design and fabrication : Optical design and fabrication

Original Manuscript: May 10, 2001
Revised Manuscript: September 6, 2001
Published: January 10, 2002

Jörgen Bengtsson and Mathias Johansson, "Fan-out diffractive optical elements designed for increased fabrication tolerances to linear relief depth errors," Appl. Opt. 41, 281-289 (2002)

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