We demonstrate a computationally efficient procedure for determining only the semiconductor sites in a confocal reflectance image of an integrated circuit. It utilizes a one-photon optical beam-induced current (1P-OBIC) and confocal reflectance images that are generated from the same focused excitation beam. A 1P-OBIC image is a two-dimensional map of the currents induced by the beam as it is scanned across the circuit surface. A 1P-OBIC is produced by an illuminated semiconductor material if the excitation photon energy exceeds the bandgap. The 1P-OBIC image has no vertical resolution because the 1P-OBIC is linear with the excitation beam intensity. The exclusive high-contrast image of semiconductor sites is generated by the product of the 1P-OBIC image and the confocal image. High-contrast images of the metal sites are also obtained by the product of the complementary OBIC image and the same confocal image.
© 2002 Optical Society of America
Original Manuscript: December 10, 2001
Revised Manuscript: March 26, 2002
Published: July 10, 2002
Vincent R. Daria, Jelda J. Miranda, and Caesar Saloma, "High-contrast images of semiconductor sites via one-photon optical beam–induced current imaging and confocal reflectance microscopy," Appl. Opt. 41, 4157-4161 (2002)