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Applied Optics

Applied Optics


  • Vol. 41, Iss. 22 — Aug. 1, 2002
  • pp: 4443–4450

High-resolution imaging ellipsometer

Qiwen Zhan and James R. Leger  »View Author Affiliations

Applied Optics, Vol. 41, Issue 22, pp. 4443-4450 (2002)

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We report on a novel imaging ellipsometer using a high-numerical-aperture (NA) objective lens capable of measuring a two-dimensional ellipsometric signal with high resolution. Two-dimensional ellipsometric imaging is made possible by spatial filtering at the pupil plane of the objective. A Richards-Wolf vectorial diffraction model and geometrical optics model are developed to simulate the system. The thickness profile of patterned polymethyl methacrylate is measured for calibration purposes. Our instrument has a sensitivity of 5 Å and provides spatial resolution of approximately 0.5 µm with 632.8-nm illumination. Its capability of measuring refractive-index variations with high spatial resolution is also demonstrated.

© 2002 Optical Society of America

OCIS Codes
(050.1960) Diffraction and gratings : Diffraction theory
(070.6110) Fourier optics and signal processing : Spatial filtering
(080.2740) Geometric optics : Geometric optical design
(120.2130) Instrumentation, measurement, and metrology : Ellipsometry and polarimetry

Original Manuscript: November 19, 2001
Revised Manuscript: March 11, 2002
Published: August 1, 2002

Qiwen Zhan and James R. Leger, "High-resolution imaging ellipsometer," Appl. Opt. 41, 4443-4450 (2002)

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