A new method for total surface measurement based on reflection ellipsometry is presented. By scanning the surface of the target under test with a focused laser beam, one can measure the surface topography and its material distribution simultaneously with high lateral resolution. Target topography is determined by ellipsometric measurement of local gradient angles γ<sub><i>x</i></sub> and γ<sub><i>y</i></sub> of the target’s scanned surface elements. To identify the material, one measures the local complex refractive index <i>n</i>, too. The influence of beam focusing on the measurement results is discussed. We describe successful tests with various dielectric and metallic surfaces by use of He-Ne (632-nm) and He-Cd (442-nm) lasers.
© 2002 Optical Society of America
(120.2130) Instrumentation, measurement, and metrology : Ellipsometry and polarimetry
(120.6650) Instrumentation, measurement, and metrology : Surface measurements, figure
(160.4760) Materials : Optical properties
Ulrich Neuschaefer-Rube and Wolfgang Holzapfel, "Simultaneous Measurement of Surface Geometry and Material Distribution by Focusing Ellipsotopometry," Appl. Opt. 41, 4526-4535 (2002)