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Applied Optics

Applied Optics


  • Vol. 41, Iss. 22 — Aug. 1, 2002
  • pp: 4526–4535

Simultaneous measurement of surface geometry and material distribution by focusing ellipsotopometry

Ulrich Neuschaefer-Rube and Wolfgang Holzapfel  »View Author Affiliations

Applied Optics, Vol. 41, Issue 22, pp. 4526-4535 (2002)

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A new method for total surface measurement based on reflection ellipsometry is presented. By scanning the surface of the target under test with a focused laser beam, one can measure the surface topography and its material distribution simultaneously with high lateral resolution. Target topography is determined by ellipsometric measurement of local gradient angles γ x and γ y of the target’s scanned surface elements. To identify the material, one measures the local complex refractive index n, too. The influence of beam focusing on the measurement results is discussed. We describe successful tests with various dielectric and metallic surfaces by use of He-Ne (632-nm) and He-Cd (442-nm) lasers.

© 2002 Optical Society of America

OCIS Codes
(120.2130) Instrumentation, measurement, and metrology : Ellipsometry and polarimetry
(120.6650) Instrumentation, measurement, and metrology : Surface measurements, figure
(160.4760) Materials : Optical properties

Original Manuscript: May 7, 2001
Revised Manuscript: January 4, 2002
Published: August 1, 2002

Ulrich Neuschaefer-Rube and Wolfgang Holzapfel, "Simultaneous measurement of surface geometry and material distribution by focusing ellipsotopometry," Appl. Opt. 41, 4526-4535 (2002)

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