An innovative fabrication technique is introduced that is based on multiple-exposure techniques for micro-optics fabrication. This method utilizes various exposure times and combinations of binary and analog photo masks to sculpture complex photoresist profiles. It also demonstrates the fabrication of analog structures from the multilevel structures thus formed by using resist reflow.
© 2002 Optical Society of America
(110.5220) Imaging systems : Photolithography
Original Manuscript: March 25, 2002
Revised Manuscript: July 1, 2002
Published: October 10, 2002
Mahesh Pitchumani, Heidi Hockel, Waleed Mohammed, and Eric G. Johnson, "Additive lithography for fabrication of diffractive optics," Appl. Opt. 41, 6176-6181 (2002)