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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 41, Iss. 29 — Oct. 10, 2002
  • pp: 6176–6181

Additive lithography for fabrication of diffractive optics

Mahesh Pitchumani, Heidi Hockel, Waleed Mohammed, and Eric G. Johnson  »View Author Affiliations


Applied Optics, Vol. 41, Issue 29, pp. 6176-6181 (2002)
http://dx.doi.org/10.1364/AO.41.006176


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Abstract

An innovative fabrication technique is introduced that is based on multiple-exposure techniques for micro-optics fabrication. This method utilizes various exposure times and combinations of binary and analog photo masks to sculpture complex photoresist profiles. It also demonstrates the fabrication of analog structures from the multilevel structures thus formed by using resist reflow.

© 2002 Optical Society of America

OCIS Codes
(050.1970) Diffraction and gratings : Diffractive optics
(110.5220) Imaging systems : Photolithography

Citation
Mahesh Pitchumani, Heidi Hockel, Waleed Mohammed, and Eric G. Johnson, "Additive lithography for fabrication of diffractive optics," Appl. Opt. 41, 6176-6181 (2002)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-41-29-6176


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References

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  7. M. B. Stern, “Pattern transfer for diffractive and refractive microoptics,” in Microelectronic Engineering (Elsevier Science, Amsterdam, 1997), Vol. 34, pp. 299–319.
  8. M. LeCompte, X. a. Gao, and D. W. Prather, “Photoresist characterization and linearization procedure for the gray-scale fabrication of diffractive optical elements,” Appl. Opt. 40, 5921–5927 (2001).
  9. S. A. Ekhorutomwen and S. P. Sawan, “Critical review on photo resists,” in Polymers in Optics: Physics, Chemistry and Applications, R. A. Lessard and W. F. Frank, eds., Vol. CR63 of SPIE Critical Review Series (SPIE, Bellingham, Wash., 1996), pp. 214–238.
  10. S Martellucci, and A. N. Chester, (eds.) Diffractive Optics and Optical Microsystems (Plenum, New York, 1997), pp. 23–33.
  11. J. R. Shents and B. W. Smith, Microlithography, Science and Technology (Marcel Dekker, New York, 1998), pp. 109–152.

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