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Applied Optics

Applied Optics


  • Vol. 41, Iss. 34 — Dec. 2, 2002
  • pp: 7167–7172

Metrology of pulsed radiation for 157-nm lithography

Mathias Richter, Udo Kroth, Alexander Gottwald, Christopher Gerth, Kai Tiedtke, Terubumi Saito, Ivan Tassy, and Klaus Vogler  »View Author Affiliations

Applied Optics, Vol. 41, Issue 34, pp. 7167-7172 (2002)

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In the framework of current developments in 157-nm lithography we have investigated the performance of photodetectors with emphasis to their stability and linearity. The measurements were performed in the radiometry laboratories of the Physikalisch-Technische Bundesanstalt at the Berlin electron-storage rings BESSY I and BESSY II with spectrally dispersed synchrotron radiation as well as with highly pulsed F2 laser radiation at 157 nm in combination with a cryogenic radiometer as the primary detector standard. Relative standard uncertainties of as little as 1% were achieved for the calibration of photodetectors in the spectral range of ultraviolet and vacuum-ultraviolet radiation.

© 2002 Optical Society of America

OCIS Codes
(040.5160) Detectors : Photodetectors
(120.3940) Instrumentation, measurement, and metrology : Metrology
(120.5630) Instrumentation, measurement, and metrology : Radiometry

Original Manuscript: April 25, 2002
Revised Manuscript: August 26, 2001
Published: December 1, 2002

Mathias Richter, Udo Kroth, Alexander Gottwald, Christopher Gerth, Kai Tiedtke, Terubumi Saito, Ivan Tassy, and Klaus Vogler, "Metrology of pulsed radiation for 157-nm lithography," Appl. Opt. 41, 7167-7172 (2002)

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