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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 41, Iss. 34 — Dec. 2, 2002
  • pp: 7179–7186

Sensitivity analysis of grating parameter estimation

Petre C. Logofătu  »View Author Affiliations


Applied Optics, Vol. 41, Issue 34, pp. 7179-7186 (2002)
http://dx.doi.org/10.1364/AO.41.007179


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Abstract

An optimization method for the sensitivity of diffraction efficiency measurements is presented. I define the sensitivity as the estimation precision of the grating parameters. The optimization method called sensitivity analysis for fitting scans all the possible measurement configurations and selects the configuration that yields the best sensitivity. The scan is made over the domain of the experimental parameters of the arrangement, such as the azimuth angle of the grating and the orientation angles of the analyzer and the polarizer. These parameters can be freely varied, and among the multitude of possible combinations there is one configuration that provides optimum sensitivity. Comparison with experimental results reveals a qualitative agreement between theory and practice.

© 2002 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(120.0120) Instrumentation, measurement, and metrology : Instrumentation, measurement, and metrology
(120.5700) Instrumentation, measurement, and metrology : Reflection
(260.2130) Physical optics : Ellipsometry and polarimetry
(260.5430) Physical optics : Polarization

History
Original Manuscript: February 20, 2002
Revised Manuscript: May 16, 2002
Published: December 1, 2002

Citation
Petre C. Logofătu, "Sensitivity analysis of grating parameter estimation," Appl. Opt. 41, 7179-7186 (2002)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-41-34-7179


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References

  1. L. E. Ocola, D. S. Fryer, G. Reynolds, A. Krasnoperova, F. Cerina, “Scanning force microscopy measurements of latent image topography in chemically amplified resists,” Appl. Phys. Lett. 68, 717–719 (1996). [CrossRef]
  2. M. Postek, D. Joy, “Submicrometer microelectronics dimensional metrology: scanning electron microscopy,” J. Res. Natl. Bur. Stand. 92, 205–228 (1987). [CrossRef]
  3. A. Sicignano, M. Vaez-Iravani, “Precision metrology of integrated circuit critical dimensions using in situ differential scanning electron microscopy,” Scanning 10, 201–206 (1988). [CrossRef]
  4. I. Kallioniemi, J. Saarinen, E. Oja, “Characterization of diffraction gratings in a rigorous domain with optical scatterometry: hierarchical neural-network model,” Appl. Opt. 38, 5920–5930 (1999). [CrossRef]
  5. S. Hava, M. Auslender, “Optical scatterometry evaluation of groove depth in lamellar silicon grating structures,” Opt. Eng. 40, 1244–1248 (2001). [CrossRef]
  6. J. R. McNeil, S. S. H. Naqvi, S. M. Gaspar, K. C. Hickman, S. R. Wilson, “Optical scatterometry,” in Encyclopedia of Materials Characterization, C. A. Evans, C. R. Brundle, S. Wilson, eds. (Manning, Boston, 1992).
  7. C. J. Raymond, J. R. McNeil, S. S. H. Naqvi, “Scatterometry for CD measurements of etched structures,” in Metrology, Inspection, and Process Control for Microlithography X, S. K. Jones, ed., Proc. SPIE2725, 720–728 (1996).
  8. J. R. McNeil, S. S. H. Naqvi, S. M. Gaspar, K. C. Hickman, K. P. Bishop, L. M. Milner, R. H. Krukar, G. A. Petersen, “Scatterometry applied to microelectronic processing,” Microlithogr. World 1, 16–22 (1992).
  9. B. K. Minhas, S. L. Prins, S. S. H. Naqvi, J. R. McNeil, “Toward sub-0.1-µm CD measurements using scatterometry,” in Metrology, Inspection, and Process Control for Microlithography X, S. K. Jones, ed., Proc. SPIE2725, 729–739 (1996).
  10. B. K. Minhas, S. A. Coulombe, S. S. H. Naqvi, J. R. McNeil, “Ellipsometric scatterometry for the metrology of sub-0.1-µm-linewidth structures,” Appl. Opt. 37, 5112–5115 (1998). [CrossRef]
  11. S. A. Coulombe, P. C. Logofatu, B. K. Minhas, S. S. H. Naqvi, J. R. McNeil, “Ellipsometric scatterometry for sub-0.1-mm CD measurements,” in Metrology, Inspection, and Process Control for Microlithography XII, B. Singh, ed., Proc. SPIE3332, 282–293 (1998).
  12. P. C. Logofatu, J. R. McNeil, “Sensitivity analysis of fitting for scatterometry,” in Metrology, Inspection, and Process Control for Microlithography XIII, B. Singh, ed., Proc. SPIE3677, 177–183 (1999).
  13. E. Collett, Polarized Light: Fundamentals and Applications (Marcel Dekker, New York, 1993).
  14. R. M. A. Azzam, N. M. Bashara, “Polarization characteristics of scattered radiation from a diffraction grating by ellipsometry with applications to surface roughness,” Phys. Rev. B 5, 4721–4729 (1972). [CrossRef]
  15. R. M. A. Azzam, N. M. Bashara, “Generalized ellipsometry for surfaces with directional preference: application to diffraction gratings,” J. Opt. Soc. Am 62, 1521–1523 (1972). [CrossRef]
  16. R. M. A. Azzam, “Application of generalized ellipsometry to anisotropic crystals,” J. Opt. Soc. Am. 64, 128–133 (1974). [CrossRef]
  17. P. R. Bevington, D. K. Robinson, Data Reduction and Error Analysis for the Physical Sciences (McGraw-Hill, Boston, 1992).
  18. G. B. Arfken, H. J. Weber, Mathematical Methods for Physicists (Academic, San Diego, Calif., 2001).
  19. L. Li, “Symmetries of cross-polarization diffraction coefficients of gratings,” J. Opt. Soc. Am. A 17, 881–887 (2000). [CrossRef]
  20. P. C. Logofatu, “Sensitivity-optimized scatterometry,” Ph.D. dissertation (University of New Mexico, Albuquerque, N. Mex., 2000).
  21. P. C. Logofatu, J. R. McNeil, “Identity of the cross-reflection coefficients for symmetric surface-relief gratings,” J. Opt. Soc. Am. A 16, 1108–1114 (1999). [CrossRef]

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