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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 42, Iss. 10 — Apr. 1, 2003
  • pp: 1847–1851

Wave-front correction methods for extreme-ultraviolet multilayer reflectors

Mandeep Singh, Matthieu F. Bal, Joseph J. M. Braat, Denis Joyeux, and Udo Dinger  »View Author Affiliations


Applied Optics, Vol. 42, Issue 10, pp. 1847-1851 (2003)
http://dx.doi.org/10.1364/AO.42.001847


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Abstract

In this theoretical study we show that by removing or depositing additional multilayer (ML) periods of a thin-film interference coating, distortions in the reflected wave front induced by surface figure errors can be corrected. At λ = 13.4 nm in the extreme-ultraviolet region the removal or deposition of a single period of the standard two-component molybdenum-silicon (Mo/Si) ML interference coating induces an effective phase change of magnitude 0.043π with respect to an identical optical thickness in vacuum. The magnitude of this wave-front shift can be enhanced with multicomponent MLs optimized for phase change on reflection. We briefly discuss the contributions of the shift in the effective reflection surface of the ML on the phase change. We also predict the feasibility of novel phase-shifting masks for subwavelength imaging applications.

© 2003 Optical Society of America

OCIS Codes
(160.3900) Materials : Metals
(230.4170) Optical devices : Multilayers
(310.6860) Thin films : Thin films, optical properties
(340.7470) X-ray optics : X-ray mirrors

History
Original Manuscript: July 12, 2002
Revised Manuscript: December 17, 2002
Published: April 1, 2003

Citation
Mandeep Singh, Matthieu F. Bal, Joseph J. M. Braat, Denis Joyeux, and Udo Dinger, "Wave-front correction methods for extreme-ultraviolet multilayer reflectors," Appl. Opt. 42, 1847-1851 (2003)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-42-10-1847


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References

  1. C. W. Gwyn, R. Stulen, D. Sweeney, D. Attwood, “Extreme ultraviolet lithography,” J. Vac. Sci. Technol. B 16, 3142–3149 (1998). [CrossRef]
  2. H. A. Macleod, Thin-Film Optical Filters, 2nd ed. (Adam Hilger, Bristol, UK, 1986), pp. 11–43.
  3. B. L. Henke, E. M. Gullikson, J. C. Davis, “X-ray interactions: photoabsorption, scattering, transmission, and reflection at E = 50–30,000 eV, Z = 1–92,” At. Data Nucl. Data Tables 54, 181–342 (1993), http://www-cxro.lbl.gov/optical_constants . [CrossRef]
  4. J. J. M. Braat, “Phase correcting layers in EUV imaging systems for microlithography,” in Extreme Ultraviolet Lithography, G. Kubiak, D. Kania, eds., Vol. 4 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 1996), pp. 152–155.
  5. M. Yamamoto, “Sub-nanometer figure error correction of an extreme ultraviolet multilayer mirror by its surface milling,” Nucl. Instrum. Methods Phys. Res. A 467–468, 1282–1285 (2001). [CrossRef]
  6. M. Singh, J. J. M. Braat, “Design of multilayer extreme-ultraviolet mirrors for enhanced reflectivity,” Appl. Opt. 39, 2189–2197 (2000). [CrossRef]
  7. M. Singh, J. J. M. Braat, “Improved theoretical reflectivities of extreme-ultraviolet mirrors,” in Emerging Lithographic Technologies IV, E. A. Dobisz, ed., Proc. SPIE3997, 412–419 (2000). [CrossRef]
  8. J. I. Larruquert, “Reflectance enhancement in the extreme ultraviolet and soft x rays by means of multilayers with more that two materials,” J. Opt. Soc. Am. A 19, 391–397 (2002). [CrossRef]
  9. C. K. Madsen, J. H. Zhao, Optical Filter Design and Analysis (Wiley Interscience, New York, 1999), p. 285.
  10. M. F. Bal, F. Bociort, J. J. M. Braat, “The influence of multilayers on the optical performance of extreme ultraviolet projection systems”, in International Optical Design Conference 2002, P. K. Manhart, J. M. Sasian, eds., Proc. SPIE4832, 149–157 (2002). [CrossRef]

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