Extreme ultraviolet (EUV) lithography uses reflective ring-field projection systems. Geometrical obstruction limits the possible system configurations to small domains of the parameter space. We present an analysis, a search method, and a classification of these unobstructed domains. The exhaustive search method based on paraxial analysis provides an effective means for determining all possible design forms and for finding useful starting configurations for optimization. The approach is validated through comparison with finite ray tracing.
© 2003 Optical Society of America
Original Manuscript: June 24, 2002
Revised Manuscript: January 23, 2003
Published: May 1, 2003
Matthieu F. Bal, Florian Bociort, and Joseph J. M. Braat, "Analysis, search, and classification for reflective ring-field projection systems," Appl. Opt. 42, 2301-2311 (2003)