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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 42, Iss. 13 — May. 1, 2003
  • pp: 2301–2311

Analysis, search, and classification for reflective ring-field projection systems

Matthieu F. Bal, Florian Bociort, and Joseph J. M. Braat  »View Author Affiliations


Applied Optics, Vol. 42, Issue 13, pp. 2301-2311 (2003)
http://dx.doi.org/10.1364/AO.42.002301


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Abstract

Extreme ultraviolet (EUV) lithography uses reflective ring-field projection systems. Geometrical obstruction limits the possible system configurations to small domains of the parameter space. We present an analysis, a search method, and a classification of these unobstructed domains. The exhaustive search method based on paraxial analysis provides an effective means for determining all possible design forms and for finding useful starting configurations for optimization. The approach is validated through comparison with finite ray tracing.

© 2003 Optical Society of America

OCIS Codes
(080.2740) Geometric optics : Geometric optical design
(110.3960) Imaging systems : Microlithography
(340.7440) X-ray optics : X-ray imaging

History
Original Manuscript: June 24, 2002
Revised Manuscript: January 23, 2003
Published: May 1, 2003

Citation
Matthieu F. Bal, Florian Bociort, and Joseph J. M. Braat, "Analysis, search, and classification for reflective ring-field projection systems," Appl. Opt. 42, 2301-2311 (2003)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-42-13-2301

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