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Applied Optics

Applied Optics


  • Vol. 42, Iss. 13 — May. 1, 2003
  • pp: 2317–2326

Emissivity modeling of metals during the growth of oxide film and comparison of the model with experimental results

Tohru Iuchi, Tohru Furukawa, and Shigenobu Wada  »View Author Affiliations

Applied Optics, Vol. 42, Issue 13, pp. 2317-2326 (2003)

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Emissivity modeling of metals has been developed to elucidate behavior during the growth of oxide film, and the modeling results have been compared with experimental results. To express emissivities, pseudo-optical constants of a bare metal and of an oxide film obtained by an ellipsometer are substituted into the model equations. Emissivity behavior during the growth of an oxide film upon the surface of a specimen is shown in terms of spectral, directional, and polarized characteristics, and it coincides with the experimental results, both quantitatively and qualitatively. The modeling is simple and provides useful guidance for the development of emissivity-compensated radiation thermometry.

© 2003 Optical Society of America

OCIS Codes
(120.0120) Instrumentation, measurement, and metrology : Instrumentation, measurement, and metrology
(120.4530) Instrumentation, measurement, and metrology : Optical constants
(120.5630) Instrumentation, measurement, and metrology : Radiometry
(120.6780) Instrumentation, measurement, and metrology : Temperature
(260.5430) Physical optics : Polarization

Original Manuscript: September 11, 2002
Revised Manuscript: February 3, 2003
Published: May 1, 2003

Tohru Iuchi, Tohru Furukawa, and Shigenobu Wada, "Emissivity modeling of metals during the growth of oxide film and comparison of the model with experimental results," Appl. Opt. 42, 2317-2326 (2003)

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