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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 42, Iss. 16 — Jun. 1, 2003
  • pp: 3259–3267

Resolution limit for two-dimensional crossed-grating patterns projected by a coherent beam

Yasuyuki Unno  »View Author Affiliations


Applied Optics, Vol. 42, Issue 16, pp. 3259-3267 (2003)
http://dx.doi.org/10.1364/AO.42.003259


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Abstract

The resolution limit for two-dimensional crossed-grating patterns created by projecting mask objects by using a coherent beam has been investigated. We consider first two conventional mask types, a binary-amplitude mask and a two-level phase-shifting mask, in analyzing relationships between a diffraction-beam configuration and an image-intensity distribution. Then we derive, as a mask that overcomes the resolution limit of the conventional ones, a four-level phase-shifting structure with which the minimum image period can be reduced to 2/2 times that of the two-level phase-shifting mask.

© 2003 Optical Society of America

OCIS Codes
(070.2580) Fourier optics and signal processing : Paraxial wave optics
(110.2960) Imaging systems : Image analysis
(110.3960) Imaging systems : Microlithography
(110.5220) Imaging systems : Photolithography
(350.5730) Other areas of optics : Resolution

History
Original Manuscript: February 3, 2003
Published: June 1, 2003

Citation
Yasuyuki Unno, "Resolution limit for two-dimensional crossed-grating patterns projected by a coherent beam," Appl. Opt. 42, 3259-3267 (2003)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-42-16-3259

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