Formation of Micro-Optical Structures by Self-Writing Processes in Photosensitive Polymers
Applied Optics, Vol. 42, Issue 18, pp. 3570-3579 (2003)
http://dx.doi.org/10.1364/AO.42.003570
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Abstract
A local exposure of UV-sensitive polymers leads to a local curing. This corresponds to a saturable and irreversible nonlinear change of the refractive index, which evidently leads to a filamentation of the hardening polymer. This paper investigates the physical background of these effects and analyzes how the different influencing factors could be used for a steered, partly self-written formation of micro-optical structures. The structure formation is simulated on the basis of an iterative beam propagation method with consideration of a set of process parameters, e.g., the photoinitiator concentration or the exposure intensity. It is shown theoretically as well as experimentally that a variation of material- and exposure-specific process parameters gives opportunities for a controlled structure formation. The experimental realization of a configuration by use of a beam shaper within a UV contact exposure process is presented by means of the preparation of high-aspect-ratio conic structures.
© 2003 Optical Society of America
OCIS Codes
(130.3130) Integrated optics : Integrated optics materials
(160.4670) Materials : Optical materials
(190.4710) Nonlinear optics : Optical nonlinearities in organic materials
(190.5940) Nonlinear optics : Self-action effects
(220.3740) Optical design and fabrication : Lithography
(220.4000) Optical design and fabrication : Microstructure fabrication
Citation
Ulrich Streppel, Peter Dannberg, Christoph Wächter, Andreas Bräuer, and Richard Kowarschik, "Formation of Micro-Optical Structures by Self-Writing Processes in Photosensitive Polymers," Appl. Opt. 42, 3570-3579 (2003)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-42-18-3570
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