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Applied Optics

Applied Optics


  • Vol. 42, Iss. 19 — Jul. 1, 2003
  • pp: 4037–4044

Ion-beam etching for the precise manufacture of optical coatings

Daniel Poitras, J. A. Dobrowolski, Tom Cassidy, and Simona Moisa  »View Author Affiliations

Applied Optics, Vol. 42, Issue 19, pp. 4037-4044 (2003)

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We propose using ion-beam etching as an additional tool for the accurate control of the thickness of thin films during the manufacture of sensitive optical multilayer coatings. We use a dual ion-beam sputtering system in the deposition and etch modes. In the deposition mode both the assist and sputtering ion beams are used to produce dense films at deposition rates in the range of 0.1–0.3 nm/s. In the etch mode, only the assist ion beam is used to remove material at a rate of less than 0.1 nm/s. A very high precision in the layer thicknesses can be obtained by alternating between deposition and etch modes. We observed that etching did not significantly affect the surface quality and the uniformity of the coatings. We introduced etching into our current manufacturing process and demonstrated its potential for the fabrication of several optical multilayer systems with performances that are very sensitive to the thickness of their layers.

© 2003 Optical Society of America

OCIS Codes
(310.1620) Thin films : Interference coatings
(310.1860) Thin films : Deposition and fabrication

Original Manuscript: February 4, 2003
Revised Manuscript: February 27, 2003
Published: July 1, 2003

Daniel Poitras, J. A. Dobrowolski, Tom Cassidy, and Simona Moisa, "Ion-beam etching for the precise manufacture of optical coatings," Appl. Opt. 42, 4037-4044 (2003)

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  1. J. A. Dobrowolski, “Modern computational methods for optical thin film systems,” Thin Solid Films 34, 313–321 (1976). [CrossRef]
  2. B. T. Sullivan, J. A. Dobrowolski, G. Clarke, T. Akiyama, N. Osborne, M. Ranger, L. Howe, A. Matsumoto, Y. Song, K. Kikuchi, “Manufacture of complex optical multilayer filters using an automated deposition system,” Vacuum 54, 647–654 (1998). [CrossRef]
  3. J. A. Dobrowolski, S. Browning, M. Jacobson, M. Nadal, “2001 Optical Society of America Topical Meeting on Optical Coatings: Manufacturing Problem,” Appl. Opt. 41, 1–14 (2002).
  4. W. C. Herrman, J. R. McNeil, “Ion beam milling as a diagnostic for optical coatings,” Appl. Opt. 20, 1899–1901 (1981). [CrossRef]
  5. J. Bartella, P. H. Berning, B. Bovard, C. K. Carniglia, E. Casparis, J. A. Dobrowolski, U. J. Gibson, R. Herrmann, F. C. Ho, M. R. Jacobson, R. E. Klinger, J. A. Leavitt, H.-G. Lotz, H. A. Macleod, M. J. Messerly, D. F. Mitchell, W.-D. Muenz, K. W. Nebesny, R. Pfefferkom, S. G. Saxe, D. Y. Song, P. Swab, R. M. Swenson, W. Thoeni, F. Van Milligen, S. Vincent, A. Waldorf, “Multiple analysis of an unknown optical multilayer coating,” Appl. Opt. 24, 2625–2646 (1985). [CrossRef]
  6. D. Poitras, J. A. Dobrowolski, T. Cassidy, C. Midwinter, C. T. McElroy, “Black layer coatings for the photolithographic manufacture of diffraction gratings,” Appl. Opt. 41, 3306–3311 (2002). [CrossRef] [PubMed]
  7. J. A. Dobrowolski, “Optical thin films at the National Research Council of Canada,” presented at the Meeting of the Optical Society of Japan, Okayama, Japan, 18–19 September 1998.
  8. B. T. Sullivan, G. A. Clarke, T. Akiyama, N. Osborne, M. Ranger, J. A. Dobrowolski, L. Howe, A. Matsumoto, Y. Song, K. Kikuchi, “High-rate automated deposition system for the manufacture of complex multilayer coatings,” Appl. Opt. 39, 157–167 (2000). [CrossRef]
  9. M. Vergöhl, N. Malkome, T. Städler, T. Matthée, U. Richter, “Ex situ and in situ spectroscopic ellipsometry of MF and DC-sputtered TiO2 and SiO2 films for process control,” Thin Solid Films 351, 42–47 (1999). [CrossRef]
  10. J. C. Zwinkels, “Basics of spectrophotometry,” presented at the Photometry, Radiometry, Colorimetry Lectures, Institute for National Measurement Standards, National Research Council of Canada, Ottawa, Canada, 9–12 April 2002.
  11. D. E. Morton, B. Johs, J. Hale, “Optical monitoring of thin films using ellipsometry,” in Proceedings of the Forty-Fifth Annual Technical Conference of the Society of Vacuum Coaters (Society of Vacuum Coaters, Albuquerque, N. Mex., 2002), pp. 299–305.
  12. W. H. Knox, N. M. Pearson, K. D. Li, C. A. Hirlimann, “Interferometric measurements of femtosecond group delay in optical components,” Opt. Lett. 13, 574–576 (1988). [CrossRef] [PubMed]
  13. D. Poitras, T. Cassidy, S. Guétré, “Asymmetrical dual-cavity filters: theory and application,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. MD3-1–MD3-3.
  14. D. Poitras, T. Cassidy, S. Moisa, J. A. Dobrowolski, “The use of etching during the precise manufacture of optical multilayer coatings,” in Proceedings of the Forty-Fifth Annual Technical Conference of the Society of Vacuum Coaters (Society of Vacuum Coaters, Albuquerque, N. Mex., 2002), pp. 262–265.

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