OSA's Digital Library

Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 42, Iss. 19 — Jul. 1, 2003
  • pp: 4045–4048

Antireflection coating formed by plasma-enhanced chemical-vapor deposition for terahertz-frequency germanium optics

Iwao Hosako  »View Author Affiliations


Applied Optics, Vol. 42, Issue 19, pp. 4045-4048 (2003)
http://dx.doi.org/10.1364/AO.42.004045


View Full Text Article

Enhanced HTML    Acrobat PDF (91 KB)





Browse Journals / Lookup Meetings

Browse by Journal and Year


   


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

Share
Citations

Abstract

A method of manufacturing optical coatings for germanium optics used at terahertz frequencies has been developed. The various optical coatings used at terahertz frequencies are difficult to manufacture conventionally because these coatings must be as thick as several tens of micrometers, which is far thicker than those used in the optical region. One way to overcome this problem is to form a silicon oxide layer through plasma-enhanced chemical-vapor deposition, with silane (SiH4) as a source gas. Using this method, I formed 21-μm-thick silicon oxide films as antireflection (AR) layers for germanium optics and obtained low reflection at 1.7 THz (wavelength, λ = 175 μm). This method is easily applied to large-aperture optics and micro-optics as well as to optics with a complex surface form. The AR coatings can also be formed for photoconductive detectors made from germanium doped with gallium at a low temperature (160 °C); this low temperature ensures that the doped impurities in the germanium do not diffuse. Fabrication of optical coatings upon substrates that have refractive indices of 3.84–11.7 may also be possible by control of the refractive indices of the deposited layers.

© 2003 Optical Society of America

OCIS Codes
(260.3090) Physical optics : Infrared, far
(310.1210) Thin films : Antireflection coatings
(350.7420) Other areas of optics : Waves

History
Original Manuscript: August 26, 2002
Revised Manuscript: April 2, 2003
Published: July 1, 2003

Citation
Iwao Hosako, "Antireflection coating formed by plasma-enhanced chemical-vapor deposition for terahertz-frequency germanium optics," Appl. Opt. 42, 4045-4048 (2003)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-42-19-4045

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

You do not have subscription access to this journal. Article level metrics are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited